| AVS 52nd International Symposium | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS+TF-ThA1 Invited Paper Emerging Plasma Deposition Applications D.P. Monaghan, Gencoa, UK |
| 2:40pm | PS+TF-ThA3 Investigating the Plasma-Propellant Interaction through Experimental Modeling R. Valliere, R. Blumenthal, Auburn University |
| 3:00pm | PS+TF-ThA4 PECVD of SiO@sub 2@ Thin Film from Electron-Beam Generated Plasmas D. Leonhardt, S.G. Walton, US Naval Research Laboratory |
| 3:20pm | PS+TF-ThA5 Invited Paper Nanoparticles and Nanocoatings from Plasmas: Old Problems with a New Twist K.P. Giapis, California Institute of Technology |
| 4:00pm | PS+TF-ThA7 Effect of Substrate Material on Properties of TiN Films Deposited in the Hybrid Plasma Reactor L. Bardos, H. Barankova, L.-E. Gustavsson, Uppsala University, Sweden |
| 4:20pm | PS+TF-ThA8 Synthesis of Aligned Carbon Nanotubes by RF-Plasma-Assisted DC Plasma Chemical Vapor Deposition Y. Hayashi, T. Fukumura, Kyoto Institute of Technology, Japan, R. Utsunomiya, Nissin Electric Co. Ltd., Japan |
| 4:40pm | PS+TF-ThA9 In Situ Oxidation and Plasma Studies for Magnetic Tunnel Junctions: The Mechanism of Plasma Oxidation of Ultra-Thin Aluminum Films Unraveled M.C.M. Van De Sanden, Eindhoven University of Technology, The Netherlands, K. Knechten, Oce Technology, The Netherlands, B. Koopmans, H.J.M. Swagten, W.J.M. de Jonge, Eindhoven University of Technology, The Netherlands |
| 5:00pm | PS+TF-ThA10 High Density Plasma Processing of Si Nanocrystal Embedded SiO@sub x@ Thin Films P.C. Joshi, T.K. Li, W. Gao, Y. Ono, A.T. Voutsas, J.W. Hartzell, S.T. Hsu, SHARP Labs of America, Inc. |