AVS 52nd International Symposium
    Plasma Science and Technology Thursday Sessions
       Session PS+TF-ThA

Invited Paper PS+TF-ThA5
Nanoparticles and Nanocoatings from Plasmas: Old Problems with a New Twist

Thursday, November 3, 2005, 3:20 pm, Room 302

Session: Emerging Plasma Applications
Presenter: K.P. Giapis, California Institute of Technology
Correspondent: Click to Email

The formation of particles in processing plasmas has generally been related to contamination and lower yields and is considered undesirable. However, nanometer-size particles can have unusual properties, very different from those of bulk materials, which makes them attractive for nanotechnology applications. We have explored the formation of Si nanoparticles in continuous-flow atmospheric-pressure dc microdischarges confined in capillary tubes. The intensity and size of these discharges permits the rapid decomposition of silane, leading to nucleation and growth of 1-3 nm Si particles, whose growth is abruptly terminated as they exit the microreactor. Narrow size distributions are obtained as inferred from classification and imaging. Particles of both charge polarities are detected with similar size distribution but 2X more positively charged particles. As-grown Si particles luminesce in the blue (420nm) with a quantum efficiency of 30% and may find applications in imaging and Si-based optoelectronics. The microdischarge synthesis route is generic to any gas-phase precursor and has been also used to grow Ge and Fe nanoparticles of 1-3 nm in size in benchtop setups. Nanowires and nanotubes are promising as nanoprobes, provided they can be coated with insulating materials followed up by tip end exposure and functionalization. We have used inductively-coupled plasmas to deposit conformal fluorocarbon coatings of a few nm thickness on carbon nanotubes. The coatings provide good insulation while they improve the rigidity of the nanotubes for surface imaging. We will present results from probe immersion experiments in Hg and water. Plasmas provide a versatile way to deposit a wide variety of extremely thin coatings to enable passivation, isolation, or functionalization at the nanoscale.