AVS 52nd International Symposium
    Plasma Science and Technology Thursday Sessions
       Session PS+TF-ThA

Paper PS+TF-ThA7
Effect of Substrate Material on Properties of TiN Films Deposited in the Hybrid Plasma Reactor

Thursday, November 3, 2005, 4:00 pm, Room 302

Session: Emerging Plasma Applications
Presenter: L. Bardos, Uppsala University, Sweden
Authors: L. Bardos, Uppsala University, Sweden
H. Barankova, Uppsala University, Sweden
L.-E. Gustavsson, Uppsala University, Sweden
Correspondent: Click to Email
Parameters of TiN films deposited in the hybrid hollow cathode and microwave ECR plasma reactor can be strongly affected by the substrate material. Differences have been found between films grown on Si substrates and steel substrates, as well as between steel substrates from martensite and austenite steels. Temperature measurements by simple probes made from different materials with surfaces covered by wafers from Si or from steel confirmed substantial differences depending on individual materials. These differences can be explained by material-dependent absorptions of the microwave power as well as by enhanced particle bombardment of ferromagnetic substrates connected with deformation of the magnetic field in the hybrid plasma reactor. The effect of surface bombardment has been confirmed by voltage current measurements using electrically biased probes. The results correspond well with properties of the obtained TiN films. Observed effects could be of more general importance, e.g. for microwave ECR plasmas, magnetron sputtering as well as for most magnetized plasma systems.