| AVS 51st International Symposium | |
| Manufacturing Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | MS+AS-WeA1 Advances in X-ray Reflectivity (XRR) and X-ray Fluorescence (XRF) Measurements Provide Unique Advantages for Barrier and Metal Layer Measurements of 65 nm Node Devices J.S. Spear, Technos International, H. Murakami, S. Terada, Technos Company Limited, Japan |
| 2:20pm | MS+AS-WeA2 Invited Paper Non-Destructive Ultra-Thin Film (0-100A) Analysis in the Lab and the Fab. C.R. Brundle, C. R. Brundle and Associates |
| 3:00pm | MS+AS-WeA4 Crystalline Structure and Stress Characterization in Thin Films by Means of Optical Spectroscopy G. Conti, Y. Uritsky, Applied Materials, Inc. |
| 3:20pm | MS+AS-WeA5 Optical Properties (IR to VUV) and Birefringence of Graphite-like Amorphous Carbon S. Zollner, R. Liu, R.B. Gregory, W. Qin, J. Kulik, N.V. Edwards, K. Junker, Motorola, T.E. Tiwald, J.A. Woollam Co. |
| 3:40pm | MS+AS-WeA6 Invited Paper Metrology for Advanced Manufacturing M.I. Current, Frontier Semiconductor |
| 4:20pm | MS+AS-WeA8 Total Analysis of the Gases in Semiconductor Manufacturing Process: Use of Ion Attachment Mass Spectrometry M. Nakamura, Y. Taneda, Y. Hirano, Y. Shiokawa, ANELVA Technix Corporation, Japan, M. Takayanagi, M. Nakata, Tokyo University of Agriculture and Technology, Japan |
| 4:40pm | MS+AS-WeA9 Optimizing and Managing Calibration Gas Inventories to Address Accuracy, Analysis Shelf Life and the Cost of Ownership P. Somssich, Osram Sylvania, Inc. |