AVS 50th International Symposium
    Semiconductors Wednesday Sessions

Session SC+EM-WeP
Poster Session

Wednesday, November 5, 2003, 11:00 am, Room Hall A-C


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

SC+EM-WeP1
STM Observation of Dopant Atoms and Point Defects in the p-type GaAs (110) Surface at 5K
B. Grandidier, G. Mahieu, D. Deresmes, J.P. Nys, D. Stievenard, IEMN-CNRS, France, P. Ebert, IFF-Julich, Germany
SC+EM-WeP3
Metal-Oxide-Semiconductor Field Effect Transistors Investigated by Scanning Capacitance Force Microscopy
K. Kimura, K. Kobayashi, H. Yamada, Kyoto University, Japan, K. Usuda, Toshiba Corporation, Japan, K. Matsushige, Kyoto University, Japan
SC+EM-WeP4
Effect of Mn Composition on Characterization of Zn@sub 1-x@Mn@sub x@Se Epilayers
Y.-D. Choi, Y.-M. Yu, D.-J. Kim, K.-J. Lee, Mokwon University, South Korea, Byungsung O, K.-S. Lee, Chungnam National University, South Korea, I.-H. Choi, Chung-Ang University, South Korea, M.-Y. Yoon, Joongbu University, South Korea
SC+EM-WeP5
Linear Magnetoresistance in LaSb@sub 2@: The Role of Charge-Density Waves@footnote *@
A. Acatrinei, Louisiana State University, J.W. Richardson, Argonne National Laboratory, D. Young, D. Browne, Y. Losovyj, P.T. Sprunger, R.L. Kurtz, Louisiana State University
SC+EM-WeP6
Ferromagnetic Co-Implanted Rutile TiO@sub 2@(110) for Spintronics Applications
V. Shutthanandan, S. Thevuthasan, T. Droubay, S.M. Heald, M.H. Englehard, L.V. Saraf, S.A. Chambers, Pacific Northwest National Laboratory, B.S. Mun, Lawrence Berkeley National Laboratory, R.P. Sears, B. Taylor, B.S. Sinkovic, University of Connecticut
SC+EM-WeP7
The Crystallization Behavior and Interfacial Reaction between GeTe and Sb@sub 2@Te@sub 3@ Film for the Application to the Phase Change Memory
E.J. Jung, S.K. Kang, B.G. Min, Yonsei University, South Korea, H. Horii, Y.H. Ha, J.H. Park, Samsung, South Korea, D.H. Ko, Yonsei University, South Korea
SC+EM-WeP8
The Dependence of Charge Collection Efficiency on Metal Electrode in Polycrystalline CdZnTe(x=0.04) Material
S.Y. Ahn, K.H. Kim, Korea University, S.Y. An, Korea Institute of Science and Technology, J.K. Hong, K.N. Oh, S.U. Kim, Korea University
SC+EM-WeP9
Surface Passivation of HgCdTe by RF Sputtered Silicon Nitride
S.Y An, Korea University, Y.C. Joung, Hanyang University, Korea, S.H Lee, Korea University, S.H. Suh, J.S Kim, Korea Institute of Science and Technology
SC+EM-WeP10
Growth and Characterization of Thin Films of a New Semiconductor produced by Co-Sputtering of CdTe and Al@footnote 1@
M. Melendez-Lira, Cinvestav-IPN, Mexico, M. Zapata-Torres, CICATA-IPN, Mexico, S. Jimenez-Sandoval, Cinvestav-IPN, Mexico, M.A. Fuentes-Cabrera, Carnegie Mellon University
SC+EM-WeP11
Current Mapping of GaN Films
A.A. Pomarico, University of Lecce, Italy, J.C. Dickinson, Virginia Commonwealth University, R. Cingolani, University of Lecce, Italy, H. Morkoc, A.A. Baski, Virginia Commonwealth University