| AVS 49th International Symposium | |
| Thin Films | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-WeP1 Effects of Starting Material of Aluminum Doped Zinc Oxide Under-layer on the Electric Properties of Palladium Doped Silver Film T. Oyama, M. Maekawa, T. Yanagisawa, Asahi Glass Co., Ltd., Japan |
| TF-WeP2 The Synthesis and Characterization of Indium Tin Oxide Films by Cesium Assisted Sputtering System at Low Temperature D.Y. Lee, H.K. Baik, Yonsei University, Korea, S.J. Lee, Kyungsung University, Korea, K.M. Song, Konkuk University, Korea |
| TF-WeP3 Deposition of ZnO Films by Reactive Sputtering in CO@sub 2@ Atmosphere N. Aomine, K. Sato, E. Shidouji, J. Ebisawa, Asahi Glass Co., Ltd., Japan |
| TF-WeP4 Fabrication of ZnO Thin Films by Pulsed Laser Ablation with Remote Radical Source T. Suzuki, M. Hiramatsu, N. Shimizu, Meijo University, Japan |
| TF-WeP5 XPS Study of First Stages of ZnO Growth and Nano-structure Dependence of the Polarisation Effects at ZnO/SiO@sub 2@ and ZnO/Al@sub 2@O@sub 3@ Interfaces A.I. Martin-Concepcion, F. Yubero, J.P. Espinos, A.R. Gonzalez-Elipe, CSIC-Univ. Sevilla, Spain, S. Tougaard, University of Southern Denmark |
| TF-WeP6 Fabrication of CuIn@sub 1-x@Ga@sub x@Se@sub 2@ Thin Film Solar Cells by Two-step Process H.K. Song, Seoul National University, Korea, S.G. Kim, Kyungwon University, Korea, H.J. Kim, Seoul National University, Korea, S.K. Kim, K.H. Yoon, Korea Institute of Energy Research, Korea |
| TF-WeP8 Structural and Optical Properties of the Novel Semiconducting Alloy Films Cu@sub x@Cd@sub 1-x@Te:O Grown by rf Sputtering J. Santos-Cruz, G. Torres-Delgado, R. Castanedo-P@aa e@rez, O. Jim@aa e@nez-Sandoval, CINVESTAV, Mexico, B.S. Chao, Energy Conversion Devices, S. Jim@aa e@nez-Sandoval, CINVESTAV, Mexico |
| TF-WeP9 Properties of Co-deposited ITO and ZnO Films Using a Bi-polar Pulse Power Supply and a Dual Magnetron Sputter Source M.S. Hwang, H.S. Jeong, Y.W. Seo, ITM, Inc., Korea |
| TF-WeP10 The Effects of Substrate Temperature and Ion Flux on the Opto-electronic Properties of dc Magnetron Sputtered Aluminum-doped Zinc Oxide N.W. Schmidt, T.S. Totushek, W. Kimes, J.R. Doyle, Macalester College |
| TF-WeP11 Electronic Properties of Cu(In,Ga)Se2 (CIGS)-Based Solar Cells J. AbuShama, Colorado School of Mines |
| TF-WeP12 Low Temperature Indium Tin Oxide Films Using Dual Magnetron Sputtering H.S. Jeong, M.S. Hwang, H.J. Lee, Y.W. Seo, ITM Inc., Korea, S.J. Kwon, Kyungwon University, Korea |
| TF-WeP13 High Rate Deposition of ZnO Thin Films by Vacuum Arc Plasma Evaporation T. Miyata, S. Ida, T. Minami, Kanazawa Institute of Technology, Japan |
| TF-WeP14 Photocatalytic Properties of TiO@sub2@/WO@sub3@ Bilayers Deposited by Reactive Sputtering T. Takahashi, H. Nakabayashi, J. Tanabe, N. Yamada, Toyama University, Japan |
| TF-WeP15 Influence of Preparation Conditions on Structure and Properties of WO@sub3@Films Reactively Deposited by RF Magnetron Sputtering T. Takahashi, J. Tanabe, H. Nakabayashi, N. Yamada, Toyama University, Japan |
| TF-WeP16 Ti Target Characteristics of Medium Frequency Reactive Sputtering: Process Modeling Improvement and Experimental Verification Lai Zhao, Tsinghua University, China, S. Xu, C. Fan, W. Gao, HIVAC Technology (Group) Co. Ltd., China, X. Hou, Liangzhen Cha, Tsinghua University, China |
| TF-WeP17 Effects of Deposition Conditions on Step Coverage Quality in Metal-organic Chemical Vapor Deposition of TiO@sub 2@ S.Y. No, J.H. Oh, C.S. Hwang, H.J. Kim, Seoul National University, Korea |
| TF-WeP18 Raman Spectroscopy Measurement of TiO@sub2@ Sputtered Films Changing Degree of Plasma Exposure T. Takahashi, H. Nakabayashi, J. Tanabe, N. Yamada, Toyama University, Japan, W. Mizuno, Toyama Industrial Technology Center, Japan |
| TF-WeP19 Growth Morphology of Sputter Deposited Vitreous Titanium Dioxide Films J.D. DeLoach, Texas Instruments, R.S. Sorbello, University of Wisconsin-Milwaukee, G. Scarel, Laboratorio MDM-INFM, Italy, C.R. Aita, University of Wisconsin-Milwaukee |