AVS 49th International Symposium
    Thin Films Wednesday Sessions
       Session TF-WeP

Paper TF-WeP1
Effects of Starting Material of Aluminum Doped Zinc Oxide Under-layer on the Electric Properties of Palladium Doped Silver Film

Wednesday, November 6, 2002, 11:00 am, Room Exhibit Hall B2

Session: Poster Session
Presenter: T. Oyama, Asahi Glass Co., Ltd., Japan
Authors: T. Oyama, Asahi Glass Co., Ltd., Japan
M. Maekawa, Asahi Glass Co., Ltd., Japan
T. Yanagisawa, Asahi Glass Co., Ltd., Japan
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Silver-based multilayer has been widely utilized as heat mirror for Low-E coating or transparent conductor for electromagnetic shielding. In this study, deposition conditions of the AZO(Aluminum doped zinc oxide) film were investigated to show how they affected the crystallographic property of the film and the electric property of palladium doped silver layer formed on the film in the layer system of Glass/AZO(42nm)/AgPd(1%Pd:10.5nm) deposited by DC magnetron sputtering. Starting material for AZO was aluminum doped zinc metal or aluminum oxide doped zinc oxide. Metal target was sputtered in oxygen atmosphere or carbon dioxide atmosphere whereas oxide target was sputtered in argon or argon/oxygen atmosphere. AgPd layer was deposited under the same condition. The effects of the over-layer were also investigated. Electrical resistivity was changed by up to 17% according to the deposition process of the under-layer. AgPd film deposited on AZO showed the lowest resistivity of 7.1x10E-6 @ohm@cm in the case of metal target with oxygen. On the contrary, the highest resistivity of 8.3x10E-6 @ohm@cm was observed in the case of oxide target with argon/oxygen. XRD patterns showed the most developed Ag(111) peak coupled with ZnO(002) peak in the case of metal target with oxygen and AFM observation revealed the smallest surface roughness in this case. Deposition of thin metal(Zn-Al) over-layer increased the resistivity implying the diffusion of zinc atom into silver-based layer, however the resistivity decreased with storage time. Optical constants of the films determined by spectroscopic ellipsometry(SE) and surface roughness of the films estimated by SE will be discussed.