AVS 49th International Symposium
    Thin Films Wednesday Sessions
       Session TF-WeP

Paper TF-WeP12
Low Temperature Indium Tin Oxide Films Using Dual Magnetron Sputtering

Wednesday, November 6, 2002, 11:00 am, Room Exhibit Hall B2

Session: Poster Session
Presenter: H.S. Jeong, ITM Inc., Korea
Authors: H.S. Jeong, ITM Inc., Korea
M.S. Hwang, ITM Inc., Korea
H.J. Lee, ITM Inc., Korea
Y.W. Seo, ITM Inc., Korea
S.J. Kwon, Kyungwon University, Korea
Correspondent: Click to Email
Recently, the needs of low temperature deposition processes for transparent conducting oxide(TCO) films on a plastic substrate are increasing. Flexible plastic substrates have been used in liquid crystal displays, organic lighting-emitting diodes, and organic EL displays. Indium tin oxide films were deposited in a horizontal in-line sputter system equipped with a pulsed dual magnetron sputter source[DC ~50kHz]. An ITO target of In@sub2@O@sub3@(90 wt%):SnO@sub2@(10 wt%) has been used. The substrates(glass and flexible plastic) were cleaned by an O@sub2@ plasma processes. The properties of ITO films such as electrical resistivity, optical transmission, and surface roughness were investigated with respect to O@sub2@ partial pressure, pulse frequencies, and substrate temperature(room temperature ~ 150°C). Also, we will investigate the film structure and plasma contamination difference between the pulsed single magnetron and the pulsed dual magnetron sources by XRD and RGA, respectively.