AVS 49th International Symposium | |
Surface Science | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | SS+EL+OF-ThM1 Fixation of Alkyl Groups on Si(111) Surface through C-Si Single Covalent Bond formed by Reaction of Grignard Reagent and H:Si(111) T. Yamada, T. Inoue, K. Yamada, N. Takano, T. Osaka, Waseda University, Japan, H. Harada, K. Nishiyama, I. Taniguchi, Kumamoto University, Japan |
8:40am | SS+EL+OF-ThM2 Chemomechanical Production of Sub-Micron Edge Width, Functionalized, ~20 Micron Features on Silicon M.R. Linford, Y.-Y. Lua, T.L. Niederhauser, B.A. Wacaser, Brigham Young University, I.A. Mowat, Charles Evans & Associates, A.T. Woolley, R.C. Davis, Brigham Young University, H.A. Fishman, Stanford University Medical School |
9:00am | SS+EL+OF-ThM3 Invited Paper Formation of Nanoscale Organic and Inorganic Features on Semiconductor Surfaces J.M. Buriak, Purdue University |
9:40am | SS+EL+OF-ThM5 Structures, Dynamics, and Chemical Reactivity of Si (001) at Finite Temperatures: A First Principles Study D. Pillay, Y. Wang, G.S. Hwang, The University of Texas at Austin |
10:00am | SS+EL+OF-ThM6 Superexchange Interactions in STM-Organic-Semiconductor Systems L.C. Teague, J.J. Boland, University of North Carolina at Chapel Hill |
10:20am | SS+EL+OF-ThM7 Modifying the Semiconductor Interface with Organonitriles M.A. Filler, C. Mui, C.B. Musgrave, S.F. Bent, Stanford University |
10:40am | SS+EL+OF-ThM8 Adsorption and Reaction of Allyl- and Ethyl-amine on Germanium and Silicon Surfaces P. Prayongpan, C.M. Greenlief, University of Missouri-Columbia |
11:00am | SS+EL+OF-ThM9 Adsorption Chemistry of Cyanogen Bromide and Iodide on Silicon (100) N.F. Materer, P. Rajasekar, E.B. Kadossov, Oklahoma State University |
11:20am | SS+EL+OF-ThM10 Theoretical Adsorption Studies of ICN on the Si(100) Surface E.B. Kadossov, P. Rajasekar, N.F. Materer, Oklahoma State University |
11:40am | SS+EL+OF-ThM11 Infrared Study of Adsorption of C@sub 6@H@sub 6@ onto Si(100)(2x1) M. Shinohara, H. Watanabe, Y. Kimura, H. Ishii, M. Niwano, Tohoku University, Japan |