AVS 49th International Symposium
    Surface Science Thursday Sessions
       Session SS+EL+OF-ThM

Paper SS+EL+OF-ThM2
Chemomechanical Production of Sub-Micron Edge Width, Functionalized, ~20 Micron Features on Silicon

Thursday, November 7, 2002, 8:40 am, Room C-112C

Session: Reactions and Patterning of Organics on Silicon
Presenter: M.R. Linford, Brigham Young University
Authors: M.R. Linford, Brigham Young University
Y.-Y. Lua, Brigham Young University
T.L. Niederhauser, Brigham Young University
B.A. Wacaser, Brigham Young University
I.A. Mowat, Charles Evans & Associates
A.T. Woolley, Brigham Young University
R.C. Davis, Brigham Young University
H.A. Fishman, Stanford University Medical School
Correspondent: Click to Email
We have recently reported that monolayers on silicon can be formed, and silicon substrates concomitantly patterned, when native oxide-terminated silicon is scribed with a diamond-tipped instrument in the presence of 1-alkenes,@footnote 1,2@ 1-alkynes,@footnote 1,2@ alkyl halides (chlorides, bromides, and iodides),@footnote 2,3@ and alcohols.@footnote 3,4@ Monolayers were prepared in the open laboratory with reagents that had not been degassed.@footnote 1-4@ However, while this method is particularly facile, the features produced using a diamond scribe are coarse and irregular.@footnote 1@ The high degree of edge and surface roughness in these features will no doubt limit the utility of our earlier work in some circumstances. Here we describe a substantial improvement in our earlier method by showing the production of sharp, well-defined, functionalized features on silicon that are invisible to the naked eye and very shallow. In contrast to the earlier procedure that used oxide-terminated silicon and a diamond-tipped scribe,@footnote 1-4@ this new method consists of 1) cleaning and drying a silicon shard, 2) immersing the silicon in a fluoride ion etch to remove its native oxide and produce hydrogen-terminated silicon, 3) wetting the dry, H-terminated silicon surface with a reactive liquid, and 4) scribing the surface with a small tungsten carbide ball. Both Si(100) and Si(111) were successfully patterned and functionalized with this new method. @FootnoteText@ @footnote 1@ Niederhauser, T. L.; Jiang, G.; Lua, Y.-Y.; Dorff, M. J.; Woolley, A. T.; Asplund, M. C.; Berges, D. A.; Linford, M. R. Langmuir 2001, 19, 5889-5900. @footnote 2@ Lua, Y.-Y.; Niederhauser, T. L.; Matheson, R.; Bristol, C.; Mowat, I. A.; Asplund, M. C.; Linford, M. R. In Press Langmuir 2002. @footnote 3@ Niederhauser, T. L.; Lua, Y.-Y.; Sun, Y.; Jiang, G.; Strossman, G. S.; Pianetta, P.; Linford, M. R. Chem.Mater. 2002, 14, 27-29. @footnote 4@ Niederhauser, T. L.; Lua, Y.-Y.; Jiang, G.; Davis, S. D.; Matheson, R.; Hess, D. A.; Mowat, I. A.; Linford, M. R. In press Angewandte Chemie 2002.