| AVS 49th International Symposium | |
| Plasma Science | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS2-MoA1 Ion Flux Uniformity in Large Area High Frequency Capacitive Discharges A. Perret, P. Chabert, J. Jolly, J.P. Booth, J. Guillon, Ecole Polytechnique, France |
| 2:20pm | PS2-MoA2 Electrical Characterization of Linearly Extended Inductively Coupled Plasma Sources for Large Area Processing Y.J. Lee, K.N. Kim, Sunkyunkwan University, South Korea, S.E. Park, J.K. Lee, Pohang University of Sci. and Tech., South Korea, G.Y. Yeom, Sunkyunkwan University, South Korea |
| 2:40pm | PS2-MoA3 Optimization of Source Modules in ICP-Helicon Multi-Element Arrays for Large Area Plasma Processing J.D. Evans, F.F. Chen, University of California, Los Angeles |
| 3:00pm | PS2-MoA4 Scaling up of a Magnetic Pole Enhanced Inductively Coupled Plasma Source (MAPE-ICP) P. Colpo, T. Meziani, F. Rossi, European Commission, Joint Research Centre, Italy |
| 3:20pm | PS2-MoA5 Invited Paper Plasma Processing for Large Area Substrates V. Cassagne, M. Elyaakoubi, UNAXIS France |
| 4:00pm | PS2-MoA7 High-rate Large-area Plasma Deposition using Multiple Expanding Thermal Plasmas M. Schaepkens, C.D. Iacovangelo, General Electric Global Research Center |
| 4:20pm | PS2-MoA8 Reflective Enhancement of Distributed Helicon Sources F.F. Chen, University of California, Los Angeles |