AVS 49th International Symposium
    Plasma Science Monday Sessions
       Session PS2-MoA

Paper PS2-MoA4
Scaling up of a Magnetic Pole Enhanced Inductively Coupled Plasma Source (MAPE-ICP)

Monday, November 4, 2002, 3:00 pm, Room C-105

Session: Plasma Processing for Large Area Substrates
Presenter: T. Meziani, European Commission, Joint Research Centre, Italy
Authors: P. Colpo, European Commission, Joint Research Centre, Italy
T. Meziani, European Commission, Joint Research Centre, Italy
F. Rossi, European Commission, Joint Research Centre, Italy
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The principles of a Magnetic Pole Enhanced Inductively Coupled Plasma are presented. Plasma characterisation made on a 200mm source show that the electrical coupling efficiency is increased by a factor 4 as compared to a conventional flat coil configuration. Scaling up of the reactor to the dimension of 800x800mm poses several technological problems that have been solved and are presented. Characterisation of the large scale source show that a plasma density of 2 to 4 E11cm-3 with an Ar plasma at 2MHz is obtained and an homogeneity of the ion current density better than 20% over 800mm. Application of the source to the etching of SiO2 layers is presented. Etching rates of the order of 100nm/mn are obtained over the whole area. Results of plasma characterisation and chemistry are presented.