AVS 49th International Symposium
    Plasma Science Monday Sessions
       Session PS2-MoA

Paper PS2-MoA2
Electrical Characterization of Linearly Extended Inductively Coupled Plasma Sources for Large Area Processing

Monday, November 4, 2002, 2:20 pm, Room C-105

Session: Plasma Processing for Large Area Substrates
Presenter: Y.J. Lee, Sunkyunkwan University, South Korea
Authors: Y.J. Lee, Sunkyunkwan University, South Korea
K.N. Kim, Sunkyunkwan University, South Korea
S.E. Park, Pohang University of Sci. and Tech., South Korea
J.K. Lee, Pohang University of Sci. and Tech., South Korea
G.Y. Yeom, Sunkyunkwan University, South Korea
Correspondent: Click to Email
In order to achieve the performance required for high resolution flat panel display (FPD) devices, especially for TFT-LCD of next generation, improved dry etch processes currently indispensable technology for semiconductor industry are required for volume manufacturing and superior critical dimension control. The plasma sources developed to date for the production of high-density and large-area plasmas mainly focused on the spiral-type planar external ICP sources. However, due to its large inductance with the scale-up to larger areas and the cost and the thickness of its dielectric material, the conventional ICP source using an external spiral antenna may have reached its limit in extending the process area. Therefore, in this study, a plasma source utilizing inductive coupling of linear extended internal antennas has been used as a candidate for the efficient large area high-density plasma source. To minimize the inherent electrostatic coupling effect in the internal inductive linear antenna configurations, various internal-type linear antenna designs have been used in a square shaped (830mm*1,020mm) plasma chamber. Characterization of the system impedance for the various internal-type antenna schemes were achieved by measuring the current, the voltage, and the phase angle difference at 13.56MHz using a V/I probe (ENI). It was found that there was a significant change in inductance depending on the type of linear antenna designs. A simple modeling and simulation with a 2-D fluid code were also used to analyze the optimum arrangement and the distance of the each line source. In this presentation, the effects of various arrangements of the linear antennas and process conditions on the plasma characteristics were investigated using a quadrupole masss spectrometer (QMS: Hidern Analytical Inc., PSM 500) and a Langmuir probe (Hiden Analytical Inc., ESP) located on the sidewall of the chamber and the results were compared with the simulation data.