AVS 49th International Symposium
    Plasma Science Monday Sessions
       Session PS2-MoA

Paper PS2-MoA7
High-rate Large-area Plasma Deposition using Multiple Expanding Thermal Plasmas

Monday, November 4, 2002, 4:00 pm, Room C-105

Session: Plasma Processing for Large Area Substrates
Presenter: M. Schaepkens, General Electric Global Research Center
Authors: M. Schaepkens, General Electric Global Research Center
C.D. Iacovangelo, General Electric Global Research Center
Correspondent: Click to Email
A unique, high rate, large area plasma deposition process has been developed to generate various functional coatings on polymeric substrates. The process relies on the integration of a plurality of individual expanding thermal plasma sources into a multi-source setup. In this work we will discuss the effects of various hardware (e.g. reagent injection configuration) and process (e.g. pressure, reagent flow, preheat) parameters on the performance of a dual-source system that has been used to apply abrasion resistant coatings to polycarbonate substrates. It will be shown that a properly engineered dual-source system can generate transparent, organosilicon-based coatings that provide uniform, glass-like abrasion resistance across substrates up to 30 cm x 30 cm. Multi-source systems comprising more than two plasma sources hold promise for generating even larger area uniform coatings.