| AVS 49th International Symposium | |
| Organic Films and Devices | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| OF+EL-WeP1 Cycloaddition of Silyl-disila-cyclopentene on Si(001) Surface B.-Y. Choi, Y.-J. Song, Y. Kuk, Seoul National University, South Korea |
| OF+EL-WeP2 Nanolithography Technique Based on Dynamic Mode Atomic Force Microscopy and Organosilane Self-Assembled Monolayers K. Hayashi, N. Saito, H. Sugimura, O. Takai, Nagoya University, Japan |
| OF+EL-WeP3 Photoemission Study of Dodecanthiol on Au (111) H. Geisler, S. Sales, Xavier University of Louisiana, J.M. Burst, S.N. Thornburg, C.A. Ventrice Jr., University of New Orleans, Y. Losovyj, P.T. Sprunger, Louisiana State University |
| OF+EL-WeP4 XPS Studies of Brilliant Green Doped Conducting Polymer Polythiophene Films H.K. Kato, S.T. Takemura, M.H. Hirayama, Kanto Gakuin University, Japan, H.M. Makihara, Kansai Research Institute, Japan |
| OF+EL-WeP5 XPS Studies of Initial Stage of Conducting Polymer Film Growth on Si Substrate H.K. Kato, S.T. Takemura, Kanto Gakuin University, Japan, H.M. Makihara, Kansai Research Institute, Japan |
| OF+EL-WeP6 Formation and Characterization of Ferrocene and Porphyrin Monolayers on Si and Ge Surfaces : Towards a Hybrid Molecular/CMOS Electronic Device A.A. Yasseri, Z. Liu, R. Dabke, University of California Riverside, V. Malinovskii, K.H. Schweikart, J.S. Lindsey, North Carolina State University, W.G. Kuhr, D.F. Bocian, K.M. Roth, University of California Riverside |
| OF+EL-WeP7 Characterization of OLED Degradation by Emission Microscope N. Miura, Y. Luo, K. Takagi, ITES Co. Ltd., Japan |
| OF+EL-WeP8 Polyatomic Ion Deposition of Thiophenic Thin Films Y. Choi, E.R. Fuoco, L. Hanley, University of Illinois at Chicago |
| OF+EL-WeP9 Mg-Phthalocyanine Thin Films with High Sensitivity for Chlorine Gas T. Miyata, S. Kawaguchi, T. Minami, Kanazawa Institute of Technology, Japan |
| OF+EL-WeP10 The Surface Stress under Ion Irradiation on Si and SAM-coated Si A.N. Itakura, M. Kitajima, Institute for Materials Science, Japan, R. Berger, IBM Deutschland Speichersysteme GmbH, Germany |
| OF+EL-WeP11 Controlled Growth of Ultrathin Molecular Films E.J. Kintzel, Jr., Florida State University, D.-M. Smilgies, Cornell High Energy Synchrotron Source, Cornell University, J.G. Skofronick, S.A. Safron, D.H. Van Winkle, Florida State University |
| OF+EL-WeP12 Current Sensing AFM Study on Electric Property of Organic Monolayer Formed on Hydrogen Terminated Si(111) via Si-C Bond K. Uosaki, J.-W. Zhao, Hokkaido University, Japan |
| OF+EL-WeP13 Surface Structure and Surface Properties of Organosilane Monolayers Selectively Assembled on the Si-wafer Substrate A. Takahara, T. Koga, M. Morita, H. Otsuka, Kyushu University, Japan |