AVS 49th International Symposium
    Organic Films and Devices Wednesday Sessions
       Session OF+EL-WeP

Paper OF+EL-WeP13
Surface Structure and Surface Properties of Organosilane Monolayers Selectively Assembled on the Si-wafer Substrate

Wednesday, November 6, 2002, 11:00 am, Room Exhibit Hall B2

Session: Organic Films and Devices
Presenter: A. Takahara, Kyushu University, Japan
Authors: A. Takahara, Kyushu University, Japan
T. Koga, Kyushu University, Japan
M. Morita, Kyushu University, Japan
H. Otsuka, Kyushu University, Japan
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Three-component micropatterned organosilane monolayers were successfully fabricated on Si-wafer substrate by stepwise vacuum ultraviolet-ray (VUV) photolithography technique with a rotation of line-type photomask. The introduction of different organosilanes was confirmed by X-ray photoelectron spectroscopy (XPS). Atomic force microscopic and lateral force microscopic observations revealed that the line-widths of micropatterned surface corresponded to those of photomask. Micropatterning of the surface functional groups influenced the magnitudes of surface free energy.