AVS 49th International Symposium
    Manufacturing Science and Technology Tuesday Sessions

Session MS-TuM
Beyond Planar CMOS: Manufacturing Issues

Tuesday, November 5, 2002, 8:20 am, Room C-109
Moderator: S Shankar, Intel Corp.


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:20am MS-TuM1 Invited Paper
A Systems Approach to Microelectronics
J. Heath, University of California, Los Angeles
9:00am MS-TuM3 Invited Paper
Integrated Circuit Technology Scaling: From Conventional CMOS to the Nanoscale Era
P. Zeitzoff, International SEMATECH
9:40am MS-TuM5 Invited Paper
Nanoelectronics - Feast or Famine?
J.A. Hutchby, V. Zhirnov, G. Bourianoff, Semiconductor Research Corporation
10:20am MS-TuM7 Invited Paper
Beyond Planar CMOS. A Reliability Perspective
J. Maiz, Intel
11:00am MS-TuM9 Invited Paper
Fabrication of Double-Gate Field Effect Transistors at the Limit of Device Scaling
H.-S.P. Wong, IBM T.J. Watson Research Center