IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Plasma Science Monday Sessions

Session PS1-MoA
Plasma-Surface Interactions I

Monday, October 29, 2001, 2:00 pm, Room 103
Moderator: S. Han, University of New Mexico


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Click a paper to see the details. Presenters are shown in bold type.

2:20pm PS1-MoA2
In-vacuo Electron-Spin-Resonce Study on Fluorocarbon Films for SiO@sub 2@ Plasma Etching
K. Ishikawa, S. Hayashi, M. Okigawa, S. Kobayashi, M. Sekine, M. Nakamura, Association of Super-Advanced Electronics Technologies (ASET), Japan, S. Yamasaki, T. Yasuda, J. Isoya, Joint Research Center of Atom Technology (JRCAT), Japan
2:40pm PS1-MoA3
The Deposition on and Etching of Si(100) by Large, Hyperthermal Fluorocarbon Ions
L. Hanley, E.R. Fuoco, M.B.J. Wijesundara, University of Illinois at Chicago
3:00pm PS1-MoA4
Gas-Phase Chemistry of SiN PECVD Process at Ambient Pressure
G.R. Nowling, S.E. Babayan, X. Yang, M. Moravej, R.F. Hicks, University of California, Los Angeles
3:20pm PS1-MoA5
Study of Surface Reaction of SiO@sub 2@ Etching by Plasma Beam Irradiation
K. Kurihara, Y. Yamaoka, M. Sekine, M. Nakamura, Association of Super-Advanced Electronics Technologies (ASET), Japan
3:40pm PS1-MoA6
Plasma Polymer Deposition and Permeation into Porous Substrates
S. Datta, J. Zhao, J. McDaniel, Procter & Gamble, S. Mukhopadhyay, P. Joshi, Wright State University
4:00pm PS1-MoA7
Mechanisms for Surface Interactions of NH@sub x@ Radicals During NH@sub 3@ Plasma Processing of Metal and Polymer Substrates
C.I. Butoi, Primax, Inc., M.L. Steen, E.R. Fisher, Colorado State University
4:20pm PS1-MoA8 Invited Paper
Plasma Chemistry, Plasma-surface Interaction, and Surface Reactions during a-Si:H and a-SiN@sub x@:H Deposition
W.M.M. Kessels, Eindhoven University of Technology, The Netherlands, E.R. Fisher, Colorado State University, E.S. Aydil, University of California, Santa Barbara, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands
5:00pm PS1-MoA10
Arc Generation from Sputtering Plasma-Dielectric Inclusion Interactions
C.E. Wickersham, J.E. Poole, A. Leybovich, J. Fan, L. Zhu, Tosoh SMD, Inc.