IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11) | |
Plasma Science | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:20pm | PS1-MoA2 In-vacuo Electron-Spin-Resonce Study on Fluorocarbon Films for SiO@sub 2@ Plasma Etching K. Ishikawa, S. Hayashi, M. Okigawa, S. Kobayashi, M. Sekine, M. Nakamura, Association of Super-Advanced Electronics Technologies (ASET), Japan, S. Yamasaki, T. Yasuda, J. Isoya, Joint Research Center of Atom Technology (JRCAT), Japan |
2:40pm | PS1-MoA3 The Deposition on and Etching of Si(100) by Large, Hyperthermal Fluorocarbon Ions L. Hanley, E.R. Fuoco, M.B.J. Wijesundara, University of Illinois at Chicago |
3:00pm | PS1-MoA4 Gas-Phase Chemistry of SiN PECVD Process at Ambient Pressure G.R. Nowling, S.E. Babayan, X. Yang, M. Moravej, R.F. Hicks, University of California, Los Angeles |
3:20pm | PS1-MoA5 Study of Surface Reaction of SiO@sub 2@ Etching by Plasma Beam Irradiation K. Kurihara, Y. Yamaoka, M. Sekine, M. Nakamura, Association of Super-Advanced Electronics Technologies (ASET), Japan |
3:40pm | PS1-MoA6 Plasma Polymer Deposition and Permeation into Porous Substrates S. Datta, J. Zhao, J. McDaniel, Procter & Gamble, S. Mukhopadhyay, P. Joshi, Wright State University |
4:00pm | PS1-MoA7 Mechanisms for Surface Interactions of NH@sub x@ Radicals During NH@sub 3@ Plasma Processing of Metal and Polymer Substrates C.I. Butoi, Primax, Inc., M.L. Steen, E.R. Fisher, Colorado State University |
4:20pm | PS1-MoA8 Invited Paper Plasma Chemistry, Plasma-surface Interaction, and Surface Reactions during a-Si:H and a-SiN@sub x@:H Deposition W.M.M. Kessels, Eindhoven University of Technology, The Netherlands, E.R. Fisher, Colorado State University, E.S. Aydil, University of California, Santa Barbara, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands |
5:00pm | PS1-MoA10 Arc Generation from Sputtering Plasma-Dielectric Inclusion Interactions C.E. Wickersham, J.E. Poole, A. Leybovich, J. Fan, L. Zhu, Tosoh SMD, Inc. |