IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Plasma Science Monday Sessions
       Session PS1-MoA

Paper PS1-MoA6
Plasma Polymer Deposition and Permeation into Porous Substrates

Monday, October 29, 2001, 3:40 pm, Room 103

Session: Plasma-Surface Interactions I
Presenter: P. Joshi, Wright State University
Authors: S. Datta, Procter & Gamble
J. Zhao, Procter & Gamble
J. McDaniel, Procter & Gamble
S. Mukhopadhyay, Wright State University
P. Joshi, Wright State University
Correspondent: Click to Email

Plasma polymerization for surface modification is gaining increased attention for industrial applications. Commercial efforts are focused, for example, on creating barrier coatings on food packaging and film-type substrates. However, another class of materials that can benefit from surface modification processes is porous substrates such as non-woven materials and woven fabrics. These materials are important for both consumer and industrial applications. Plasma polymerization is viewed as a surface modification process, that generally alters the top one micron layer of material, with no impact on bulk properties. However, for porous substrates such as fabrics and non-wovens, plasma polymerization of external as well as internal surfaces within the bulk material are important. To date, there have been few studies focused on the permeation of plasma polymerization through porous materials. This study was aimed at understanding the impact of various processing as well as substrate parameters on the permeation of plasma polymerization into porous materials. Cellulose-based filter paper was used to investigate the deposition profile and penetration of plasma treatment through porous materials. Several five or ten layer stacks of filter paper, each having different particle detention rating (different pore size) were used as model porous substrates. Plasma polymerized perfluoromethylcyclohexane (PFMCH) was deposited on these stacks and subsequent analysis of each layer in the stack was performed using X-ray photoelectron spectroscopy (XPS), contact angle measurements and water absorption rates. Correlation between these quantities will be discussed in light of the microstructure of these papers as seen by optical and electron microscopy. The dependence of plasma penetration depth upon (a) plasma parameters, (b) filter paper pore size and (c) duration of plasma treatment will be presented. @FootnoteText@ @Footnote *@J. Zhao - Current address : March Instruments, Concord, CA.