| IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11) | |
| Dielectrics | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| DI2-MoP1 Deposition of Si-C-O-H Alloy Dielectric Films as a Low Dielectric Permittivity Insulators B.K. Hwang, Dow Corning Corporation, M.J. Loboda, Wacker Siltronic Corporation, W.D. Gray, G.A. Cerny, R.F. Schneider, J.A. Seifferly, D.W. Roehl, Dow Corning Corporation |
| DI2-MoP2 Characterization of Plasma-CVD Grown Low-k Porous Silica Films using Positron-annihilation Lifetime Spectroscopy T. Ohdaira, R. Suzuki, National Institute of Advanced Industrial Technology (AIST), Japan, Y. Shioya, Semiconductor Process Laboratory Co., Ltd., Japan, T. Ishimaru, Canon Sales Co. Inc., Japan |
| DI2-MoP3 Plasma-Reacting Behaviour of Spin-on Hybrid Organic Siloxane Polymer (HOSP) Low-Dielectric-Constant Thin Films S.-T. Chen, G.-S. Chen, Feng Chia University, Taiwan, T.-C. Chang, National Sun Yat-Sen University, Taiwan, C.-P. Liu, National Cheng Kung University, Taiwan |
| DI2-MoP4 Process Characterization of Low Dielectric Constant Silicon Containing Fluorocarbon Films by Plasma Enhanced Chemical Vapor Deposition Y.Y. Jin, Louisiana State University, H. Kim, Kyungpook National University, S. Korea, G.S. Lee, Louisiana State University |
| DI2-MoP5 Etching Characteristics of Polyimide Film as Interlayer Dielectric Using Inductively Coupled Plasma P.S. Kang, C.I. Kim, Chung-Ang University, Korea, S.G. Kim, ETRI, Korea, H.S. Choi, Juseong College, Korea, C.I. Lee, Ansan College of Technology, Korea, E.G. Chang, Chung-Ang University, Korea |
| DI2-MoP6 An Opportunity to Study the Outgassing Behavior of a Novel Organic Low K Material J.F. Bernard, S. Pangrle, C. Gabriel, Advanced Micro Devices |
| DI2-MoP8 The Effect of Hydrogen Plasma Treatment on Low-k Hybird-Organic-Siloxane-Polymer (HOSP) Against Damage During Photoresist Removal T.C. Chang, National Sun Yat-Sen University, Taiwan, R.O.C., Y.S. Mor, National Chiao Tung University,Taiwan, R.O.C., P.T. Liu, National Nano Device Laboratory, Taiwan, R.O.C, T.M. Tsai, C.W. Chen, National Chiao Tung University, Taiwan, R.O.C., W.C. Gau, National Tsing Hua University, Taiwan, R.O.C., S.M. Sze, National Chiao Tung University, Taiwan, R.O.C. |