AVS 47th International Symposium
    Surface Engineering Tuesday Sessions

Session SE-TuP
Poster Session

Tuesday, October 3, 2000, 5:30 pm, Room Exhibit Hall C & D


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

SE-TuP1
General Rule to Predict Under-layer Segregation on Film Surface
M. Yoshitake, Y.-R. Aparna, K. Yoshihara, National Research Institute for Metals, Japan
SE-TuP3
Role of Surface Condition in Diamond Nucleation during Bias-enhanced Nucleation
N. Ali, W. Ahmed, Manchester Metropolitan University, UK, Q.H. Fan, University of Aveiro, Portugal, C.A. Rego, Manchester Metropolitan University, UK
SE-TuP4
High Rate Sputtering for Ni Films by r.f.-d.c. Coupled Magnetron Sputtering System with Multipolar Magnetic Plasma Confinement
K. Kawabata, T. Tanaka, Hiroshima Institute of Technology, Japan, A. Kitabatake, K. Yamada, Y. Mikami, Hiroshima Sanyo Vacuum Industries Co., LTD., Japan, H. Kajioka, K. Toiyama, Western Hiroshima Prefecture Industrial Institute of Technology, Japan
SE-TuP5
The Properties of the Wettability and Corrosion Resistance of Surface Preparation and PVD Coatings on Mold Steel
S.-M. Chiu, C.-H. Lin, W.-C. Lo, Y.-C. Chen, Metal Industries Research & Development Centre, Taiwan
SE-TuP6
On the Shielding Influence of Charged Particles on the Kinetics of the Oxide Film Growth
D.G. Mukhambetov, O.V. Chalay, Karaganda Metallurgical Institute, Kazakhstan
SE-TuP8
Characterization of Plasma-nitrided Iron by SEM, XRD and XPS
L.C. Gontijo, Centro Federal de Educacao Tecnologica do Espirito Santo, Brazil, P.A.P. Nascente, R. Machado, Universidade Federal de Sao Carlos, Brazil, E.J. Miola, L.C. Casteletti, Universidade de Sao Paulo, Brazil
SE-TuP9
Surface Charge Assisted Ion Deposition: A New Possibility of Film Structure Control
I.G. Levchenko, Kharkov State Aerospace University, Ukraine, M. Keidar, University of Michigan
SE-TuP10
Formation and Dynamic of Nuclei Distribution Function in Ion Deposition. Theoretical and Numerical Investigation
I.G. Levchenko, Kharkov State Aerospace University, Ukraine, M. Keidar, University of Michigan
SE-TuP11
Effect of Annealing on the Microstructure and Mechanical Property of TiN/AlN Multilayer Films Prepared by the Ion-beam Assisted Deposition
D.G. Kim, Kwangju Institute of Science and Technology, Korea, Y-.J. Baik, Korea Institute of Science and Technology, T.Y. Seong, Kwangju Institute of Science and Technology, Korea
SE-TuP12
Impression of High Voltage Pulses on Substrate in Pulsed Laser Deposition
T. Ikegami, T. Ohsima, M. Nakao, Kumamoto University, Japan, S. Aoqui, Sojo University, Japan, K. Ebihara, Kumamoto University, Japan
SE-TuP13
Characterization of Chromium Nitride Coatings Deposited by A Hybrid PVD and Metal Plasma Ion Implantation Process
D.-Y. Wang, K.-W. Weng, National Chung-Hsing University, Taiwan
SE-TuP14
Energy and Angular Distributions of Deposition Flux in Magnetron Sputtering Systems
R.I. Erickson, J.R. Doyle, Macalester College
SE-TuP15
The Corrosion Resistance of the Chromium Nitride on Carbon Steel by Cathodic Arc Deposition
S. Han, National Chung Hsing University, Taiwan, ROC, J.H. Lin, National Tsing Hua University, Taiwan, ROC, S.C. Chung, Industrial Technology Research Institute, Taiwan, ROC, S.H. Tsai, National Tsing Hua University, Taiwan, ROC, F.H. Lu, National Chung Hsing University, Taiwan, ROC, H.C. Shih, National Tsing Hua University, Taiwan, ROC