AVS 47th International Symposium
    Surface Engineering Tuesday Sessions
       Session SE-TuP

Paper SE-TuP9
Surface Charge Assisted Ion Deposition: A New Possibility of Film Structure Control

Tuesday, October 3, 2000, 5:30 pm, Room Exhibit Hall C & D

Session: Poster Session
Presenter: I.G. Levchenko, Kharkov State Aerospace University, Ukraine
Authors: I.G. Levchenko, Kharkov State Aerospace University, Ukraine
M. Keidar, University of Michigan
Correspondent: Click to Email
The method proposed namely Surface Charge Assisted Ion Deposition consists in using the surface electrical charge as a tool for thin film micro-structure and characteristics control. It was shown that the substrate electrical charge provides the powerful and convenient possibilities of nuclei distribution function control resulting in thin film growth with the required characteristics. Using the specified surface charge - film thickness function it is possible to influence the nuclei distribution function. Criterions of electrical controllability were determined on the basis of nucleus electrical balance. It was shown that the method can provide realization of the time-divergent and time-convergent distribution functions. Interesting are the modes provides the equalization of distribution function following by the uniform growth. The possibility to create composite films consisting of bearing very hard matrix such as TiN or TiC filled with the solid-state lubricant such as Cu is shown. The Surface Charge Assisted Deposition provides formation of high-uniform bearing matrix characterized by the high hardness and tensile strength. Other filling matters can be used to provide the wide range of thin film characteristics such as high thermal conductance, temperature conductivity etc. Experimental data on comparative tests of films deposited by the Surface Charge Assisted Deposition and films deposited with the usual methods are given. The friction test shows the film wear resistance increase by factor of 1.25 due to high wear resistance and low friction coefficient of the films applied with the controlled surface charge. The experiment set-up and test conditions are shown.