AVS 47th International Symposium
    Surface Engineering Tuesday Sessions
       Session SE-TuP

Paper SE-TuP12
Impression of High Voltage Pulses on Substrate in Pulsed Laser Deposition

Tuesday, October 3, 2000, 5:30 pm, Room Exhibit Hall C & D

Session: Poster Session
Presenter: T. Ikegami, Kumamoto University, Japan
Authors: T. Ikegami, Kumamoto University, Japan
T. Ohsima, Kumamoto University, Japan
M. Nakao, Kumamoto University, Japan
S. Aoqui, Sojo University, Japan
K. Ebihara, Kumamoto University, Japan
Correspondent: Click to Email
DLC film coatings are of technological interest for enhancing wear resistance and corrosion resistance of metals. Pulsed laser deposition (PLD) can deposit hydrogen-free DLC films, those are expected superiority in hardness and adhesion to the substrate, by graphite ablation in vacuum ambient. In PLD, controllable parameters, laser fluence, pressure and kind of ambient gas and bias voltage to a substrate, are limited. In this research, negative high voltage (HV) pulses are applied to a substrate holder synchronously with the plasma plume to modify carbon plasma plume in the similar way to plasma immersion ion implantation. Here, a carbon plasma plume produced by laser ablation is used as a high-density plasma source. High energetic carbon ions and excited atoms can be expected to improve film properties and its adhesion to the substrate. Effect of HV pulses on the plasma plume was investigated by optical emission spectrometry, laser induced fluorescence meth od and their effect on DLC films was examined using FTIR, AFM and Raman analyses. By applying HV pulses emission from C@super +@ increased and modification was found in film properties.