AVS 47th International Symposium
    Surface Engineering Tuesday Sessions
       Session SE-TuP

Paper SE-TuP13
Characterization of Chromium Nitride Coatings Deposited by A Hybrid PVD and Metal Plasma Ion Implantation Process

Tuesday, October 3, 2000, 5:30 pm, Room Exhibit Hall C & D

Session: Poster Session
Presenter: K.-W. Weng, National Chung-Hsing University, Taiwan
Authors: D.-Y. Wang, National Chung-Hsing University, Taiwan
K.-W. Weng, National Chung-Hsing University, Taiwan
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Chromium nitride coatings were deposited using a hybrid PVD and metal plasma ion implantation (MPII) process. MPII is a plasma-based ion implantation process, which supplies low energy (10-80 keV) metal ions with multiple charge states. At the initial coating stage, low dosage of MPII ion flux helps in effective surface activation and ion mixing. The interface adherence is significantly improved. A subsequent ion bombardment by MPII in conjunction with a conventional cathodic arc evaporation process provides apparent advantage of film densification and stress relaxation. The influence of ion energy of MPII source upon film properties will be conducted using mechanical and tribological tests.