| AVS 47th International Symposium | |
| Material Characterization | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | MC-ThA1 In-situ Control of Wet Chemical Etching of Patterned Bulk-GaAs using Real Time Spectroscopic Ellipsometry S.-J. Cho, P.G. Snyder, University of Nebraska, Lincoln, C.M. Herzinger, B. Johs, J. A. Woollam Co. |
| 2:20pm | MC-ThA2 In- and Ex-situ Characterization by Second-harmonic Generation of the RPECVD Oxidation and Nitridation of Silicon and Ex-situ Comparisons with Other Optical Techniques G.D. Powell, R.S. Johnson, G. Lucovsky, D.E. Aspnes, North Carolina State University |
| 2:40pm | MC-ThA3 Invited Paper What Is Needed and What Is Practically Available for Small Area, Small Depth, Chemistry Sensitive Analysis in the Semiconductor Wafer Processing Industry C.R. Brundle, Applied Materials |
| 3:20pm | MC-ThA5 Dopant-Induced Contrast of Si Devices in PEEM V.W. Ballarotto, K. Siegrist, R.J. Phaneuf, E.D. Williams, University of Maryland |
| 3:40pm | MC-ThA6 Elemental Mapping of Sub-µm Particles and Structures by LASER-SNMS and TOF-SIMS F. Kollmer, R. Kamischke, R. Ostendorf, Physikalisches Institut der Universitaet Muenster, Germany, H. Bender, Materials and Components Analysis Group IMEC, A. Benninghoven, Physikalisches Institut der Universitaet Muenster, Germany |
| 4:00pm | MC-ThA7 Dose Quantity Effects on Nano-scaled Dot Size and Depth Profile of Gallium Implantation on Silicon by Finely Focused Ion Beam L. Shen, L.C. Feldman, R.F. Haglund Jr., R.A. Weller, Vanderbilt University |
| 4:20pm | MC-ThA8 Ion Channeling Effects on the FIB Milling of Crystalline Materials B.W. Kempshall, S.M. Schwarz, University of Central Florida, B.I. Prenitzer, Lucent Technologies, L.A. Giannuzzi, University of Central Florida, R.B. Irwin, F.A. Stevie, Lucent Technologies |
| 4:40pm | MC-ThA9 XPS Analysis of Si Samples Prepared Using the FIB Lift-Out Technique A.C. Ferryman, J.E. Fulghum, Kent State University, L.A. Giannuzzi, University of Central Florida, F.A. Stevie, Cirent Semiconductor |
| 5:00pm | MC-ThA10 Determining Area Selectivity in Small-Area XPS Analysis@footnote 1@ D.R. Baer, M.H. Engelhard, Pacific Northwest National Laboratory |