| AVS 47th International Symposium | |
| Incorporating Principles of Industrial Ecology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | IE-TuA1 Invited Paper Challenges in Bringing Green Manufacturing Technologies to the Clean Room Floor S. Raoux, Applied Materials |
| 2:40pm | IE-TuA3 Invited Paper Eliminating Perfluorocompound Gas Emissions from CVD Chamber Cleans P.J. Maroulis, A.D. Johnson, W.R. Entley, Air Products and Chemicals, Inc. |
| 3:20pm | IE-TuA5 Meeting IBM's PFC Emission Goals: Using the IBM In Situ Dilute NF@sub 3@/He Plasma Clean in Production on the Applied Materials 200 mm P5000 Lamp-Heated CVD Toolset C.M. Hines, IBM Microelectronics, W.R. Entley, R.V. Pearce, A.D. Johnson, Air Products and Chemicals, Inc. |
| 3:40pm | IE-TuA6 Invited Paper Treatment of Wastes from Chemical Mechanical Polishing Operations S. Raghavan, Y. Sun, J. Baygents, University of Arizona |
| 4:20pm | IE-TuA8 Invited Paper Advanced Chemicals for Semiconductor Processing E.R. Sparks, W. Wojtczak, S.A. Fine, ATMI |
| 5:00pm | IE-TuA10 High Throughput Process for Photoresist Stripping and Residual Polymer Removal in a Via Post-Etch Process M. Boumerzoug, Q. Geng, H. Xu, Ulvac Technologies Inc., S. Gu, LSI Logic Corporation, S. Goh, Silterra (M) Sdn. Bhd., T. Meyer, J. Seaton, LSI Logic Corporation |