| AVS 46th International Symposium | |
| Thin Films Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-MoP1 Effect of HCl Catalyst in the Formation of Flat Structures of Ta@sub 2@O@sub 5@ Thin Films by Sol-Gel Technique S. Santucci, C. Cantalini, A.R. Phani, University of L'Aquila, Italy |
| TF-MoP2 Mechanical Properties and Residual Stresses in AlN Films Prepared by Ion Beam Assisted Deposition Y. Watanabe, N. Kitazawa, Y. Nakamura, National Defense Academy, Japan, C. Li, T. Sekino, K. Niihara, Osaka University, Japan |
| TF-MoP3 The Effects of Temperature and Morphology on the Electron Stimulated Desorption of H@super -@ from Thin Hydrocarbon Films A.D. Bass, L. Parenteau, F. Weik, L. Sanche, University of Sherbrooke, Canada |
| TF-MoP4 Oxidation Studies and Chemical State Analysis of Polycrystalline Magnetron Sputtered (Ti,Al)N Films A. Kale, S. Seal, S. Sundaram, University of Central Florida |
| TF-MoP5 Characterization of VO@sub 2@ Epitaxial Films with Different Orientations Grown on Sapphire (110) by Sputtering P. Jin, S. Tanemura, National Industrial Research Institute of Nagoya, Japan, K. Macak, U. Helmersson, Linkoping University, Sweden |
| TF-MoP6 Towards a Fully Monitored Fourier Transform Infrared Spectroscopic Ellipsometer J.C. Cigal, G.M.W. Kroesen, Eindhoven University of Technology, The Netherlands |
| TF-MoP7 Improved Light Stability of Colored SiO@sub 2@ Coatings Containing Organic and Metalorganic Dye Molecules L.L. Diaz-Flores, Inst. Tecnologico de Saltillo, Mexico, J.J. Perez-Bueno, Univ. Autonoma de Queretaro, Mexico, F.J. Espinoza-Beltran, R. Ramirez-Bon, Y.V. Vorobiev, J. Gonzalez-Hernandez, CINVESTAV-IPN, Mexico |
| TF-MoP8 Diamond Formation Using a Low-Pressure Inductively Coupled Plasma H. Ito, Nagoya Municipal Industrial Research Institute, Japan, K. Teii, Nagoya University, Japan, M. Ito, Wakayama University, Japan, M. Hori, Nagoya University, Japan, T. Takeo, Nagoya Municipal Industrial Research Institute, Japan, T. Goto, Nagoya University, Japan |
| TF-MoP9 Microstructure of Ti:D Films Prepared by Reactively rf Sputtering S. Nakao, P. Jin, K Saitoh, Y. Miyagawa, S. Miyagawa, National Industrial Research Institute of Nagoya, Japan |
| TF-MoP10 Growth of Si Thin Films on CeO@sub 2@/Si(111) Substrate Prepared by Electron Beam Evaporation C.G. Kim, J.H. Yang, B.S. Moon, C.Y. Park, Sung Kyun Kwan University, Korea |
| TF-MoP11 Origin of Electrical Property Distribution on Surface of ZnO:Al Films Prepared by Magnetron Sputtering T. Minami, T. Miyata, T. Yamamoto, T. Nishitani, Kanazawa Institute of Technology, Japan |
| TF-MoP12 Effect of C@sub 2@ Radicals on Diamond Growth Using Low-Pressure, Radio Frequency, CH@sub 3@OH/H@sub 2@/H@sub 2@O Inductively Coupled Plasma T. Shiomi, H. Nagai, M. Hiramatsu, M. Nawata, Meijo University, Japan |
| TF-MoP13 Properties of Indium Oxide Thin Films Prepared by Reactive Electron Beam Evaporation Technique for EMI Control J. Asbalter, A. Subrahmanyam, Indian Institute of Technology, India |
| TF-MoP14 Diffusion of Cu from PVD Al-Cu Alloy and CVD Cu Thin Films into CVD Al Thin Films Inside Submicron Via Holes B. Rogers, Vanderbilt University |
| TF-MoP15 Process Control and Properties of Aluminum Doped Zinc Oxide Films Deposited by High Rate Mid-frequency Reactive Magnetron Sputtering N. Malkomes, M. Vergöhl, B. Szyszka, T. Matthée, Fraunhofer Institute for Surface Engineering and Thin Films, Germany |
| TF-MoP16 Low-temperature Growth of Ti(C,N) Thin Films on D2 Steel and Si(100) Substrates by PEMOCVD B.-C. Kang, J.-H. Boo, Y.K. Cho, J.-G. Han, C.H. Heo, SungKyunKwan University, Korea |
| TF-MoP17 A Study on the Characteristics of TiN Thin Film Deposited by Atomic Layer Chemical Vapor Deposition Method H. Jeon, J.W. Lee, J.H. Koo, Y.S. Kim, Y.D. Kim, D.S. Kim, Hanyang University, Korea |
| TF-MoP18 Non-Stoichiometric PMN-PT Films Grown by Laser Ablation A. Fundora, Universidad de la Habana, Cuba, J.M. Siqueiros, UNAM, Mexico, J. Portelles, Universidad de la Habana, Cuba |
| TF-MoP19 The Advancing Techniques and Sputtering Effects of Oxide Films Fabricated by Stationary Plasma Thruster with Argon and Oxygen Gases J. Cho, KIST, Korea, Y. Ermakov, Mirea, Russia, K.H. Yoon, Yonsei University, Korea, S.K. Koh, KIST, Korea |
| TF-MoP20 An Alternative Procedure for the Deposition of Close-Spaced Sublimation CdTe/CdS Solar Cells H.R. Moutinho, R.G. Dhere, M.M. Al-Jassim, C. Ballif, L.L. Kazmerski, National Renewable Energy Laboratory |
| TF-MoP21 CdS/CdTe Interface Analysis by Transmission Electron Microscopy R.G. Dhere, M.M. Al-Jassim, K.M. Jones, H.R. Moutinho, T.A. Gessert, L.L. Kazmerski, National Renewable Energy Laboratory |
| TF-MoP22 In-Plane Texturing in Evaporated Cr Films J.F. Whitacre, University of Michigan, Z.U. Rek, Stanford Synchrotron Radiation Laboratory, J.C. Bilello, S.M. Yalisove, University of Michigan |
| TF-MoP23 Sputter Deposition of Ni Thin Films For Nickel Silicide Metallization H. Zhang, Tosoh SMD, Inc. |
| TF-MoP24 Synthesis of Highly Oriented Piezoelectric AlN Films by Reactive Sputter Deposition F. Engelmark, G. Fuentes, I.V. Katardjiev, A. Harsta, U. Smith, S. Berg, Uppsala University, Sweden |
| TF-MoP25 Surface Morphology Analysis in Correlation with Crystallinity of CeO@sub 2@(110) Layers on Si(100) Substrates T. Inoue, T. Nakamura, S. Nihei, Iwaki Meisei University, Japan, Y. Yamamoto, Hosei University, Japan |
| TF-MoP26 Oxide Thin Films for Electroluminescent Phosphors J.S. Lewis, P.H. Holloway, University of Florida |
| TF-MoP27 XPS and AES Investigation on the Oxidation Resistance of Plasma-treated Copper Leadframe A. Wong, Nanyang Technological University, Singapore, R.G. Krishnan, Institute of Microelectronics, Singapore, G. Sarkar, Nanyang Technological University, Singapore |
| TF-MoP29 Optimization of the Reflectivity of Magnetron Sputter Deposited Silver Films M. Vergöhl, N. Malkomes, B. Szyszka, F. Neumann, T. Matthée, Fraunhofer Institute for Surface Engineering and Thin Films, Germany, G. Bräuer, Leybold Systems GmbH, Germany |
| TF-MoP30 Preparation and Characterization of RF-sputtered SrTiO@sub 3@ Thin Films K. Radhakrishnan, C.L. Tan, H.Q. Zheng, G.I. Ng, Nanyang Technological University, Singapore |