AVS 46th International Symposium | |
Plasma Science and Technology Division | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:00pm | PS+SS-WeA1 How Does Ion Bombardment Produce Enhanced Etching? P.G.M. Sebel, L.J.F. Hermans, H.C.W. Beijerinck, Eindhoven University of Technology, The Netherlands |
2:20pm | PS+SS-WeA2 Desorption Species from Fluorocarbon Film by Ar@super +@ Ion Beam Bombardment M. Hayashi, K. Karahashi, Fujitsu Laboratories Ltd., Japan |
2:40pm | PS+SS-WeA3 NH@sub 3@ / Cl@sub 2@ Gas Assisted Etching of Copper with Focused Ion Beams K. Edinger, University of Maryland |
3:00pm | PS+SS-WeA4 Guided Ion-beam Studies of Low Energy Cu@super +@ and Cu@sub 2@@super +@ Ion Interactions with Mo S.L. Anderson, A. Lapicki, K.J. Boyd, M. Aizawa, University of Utah |
3:20pm | PS+SS-WeA5 Ion Solid Surface Interactions in IMP Cu PVD X.-Y. Liu, M.S. Daw, D.G. Coronell, V. Arunachalam, C.-L. Liu, Motorola Semiconductor Products Sector, J.D. Kress, D.E. Hanson, A.F. Voter, Los Alamos National Laboratory |
3:40pm | PS+SS-WeA6 Deposition and Etching Using Fluorocarbon Ions: Molecular Dynamics Simulations C.F. Abrams, D.B. Graves, University of California, Berkeley |
4:00pm | PS+SS-WeA7 Comparison of Thin-Film Nucleation and Growth from Ion-Beam and Cluster-Beam Deposition: Atomistic Simulations T.A. Plaisted, S.B. Sinnott, University of Kentucky |
4:20pm | PS+SS-WeA8 Understanding Plasma Polymerization by Mass Selected Ions: 25 - 50 eV CF@sub 3@@super +@ vs. C@sub 3@F@sub 5@@super +@ Ion Modification of Polystyrene M.B.J. Wijesundara, L. Hanley, University of Illinois, Chicago, B. Ni, S.B. Sinnott, University of Kentucky |
4:40pm | PS+SS-WeA9 Surface Interactions of Plasma-Generated NH@sub 2@ Radicals E.R. Fisher, J.R.D. Peers, M.L. Steen, Colorado State University |
5:00pm | PS+SS-WeA10 FT-IR and XPS Study of Plasma-treated Acrylic Coating Surfaces M.K. Shi, G.L. Graff, M.E. Gross, P.A. Mounier, M.G. Hall, Battelle Pacific Northwest National Laboratory |