AVS 46th International Symposium
    Plasma Science and Technology Division Wednesday Sessions
       Session PS+SS-WeA

Paper PS+SS-WeA8
Understanding Plasma Polymerization by Mass Selected Ions: 25 - 50 eV CF@sub 3@@super +@ vs. C@sub 3@F@sub 5@@super +@ Ion Modification of Polystyrene

Wednesday, October 27, 1999, 4:20 pm, Room 612

Session: Ion-Surface Interactions II
Presenter: M.B.J. Wijesundara, University of Illinois, Chicago
Authors: M.B.J. Wijesundara, University of Illinois, Chicago
L. Hanley, University of Illinois, Chicago
B. Ni, University of Kentucky
S.B. Sinnott, University of Kentucky
Correspondent: Click to Email
Mass selected polyatomic ions beams can both create new materials similar to plasma polymers and elucidate polyatomic-surface collision mechanisms that are fundamental to plasma polymerization and etching. The fluorocarbon ions are studied here due to their technological relevance, the large number of previous studies on related systems, and their ability to illuminate several fundamental points in polyatomic ion-surface modification and plasma polymerization. Polystyrene has been chosen because it is a typical polymer surface whose lack of heteroatoms facilitates its surface chemical analysis. Previous experiments with 10 - 100 eV SF@sub 5@@super +@ and C@sub 3@F@sub 5@@super +@ indicated different chemistry with polystyrene surfaces.@footnote 1@ This work is continued here by examination of 25 - 50 eV CF@sub 3@@super +@ vs. C@sub 3@F@sub 5@@super +@ ion reactions with polystyrene surfaces using monochromatic x-ray photoelectron spectroscopy and molecular dynamics simulations. These two fluorocarbon ions display significantly different surface chemistry at these low kinetic energies that cannot be explained simply by eV/atom arguments. @FootnoteText@ @footnote 1@E. T. Ada, O. Kornienko, L. Hanley, J. Phys. Chem. B 102, 3959-3966 (1998).