| AVS 46th International Symposium | |
| Applied Surface Science Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | AS2-MoA1 Determination by XPS of the Reactions Taking Place at the Semiconductor/'Heteropolyanion Solution' Interface A. Quennoy, A. Rothschild, A. Etcheberry, C. Debiemme-Chouvy, CNRS - France |
| 2:20pm | AS2-MoA2 Sputter Deposition and Annealing of Ta, TaSi and Ta@sub 4@B Composite Films and Their Application in Next Generation Lithography Masks K. Racette, C. Brooks, IBM |
| 2:40pm | AS2-MoA3 XPS Sputter Depth Profiling at the Pd/Y Interface@footnote *@ G. Neuert, R.J. Smith, Montana State University, J.A. Schaefer, Technische Universität Ilmenau, Germany |
| 3:00pm | AS2-MoA4 Thin Film Characterization through combined X-ray Photoelectron Spectroscopy (XPS) and X-ray Diffraction (XRD) D.J. Surman, S. Bates, Kratos Analytical Inc., C.J. Blomfield, A.J. Roberts, Kratos Analytical Inc., UK, J.E. Fulghum, Kent State University |
| 3:20pm | AS2-MoA5 Invited Paper Photoelectron Spectroscopic Investigation of Interfaces and Thin Layers for Microelectronics: Composition and Chemistry as a Function of Depth R.L. Opila, J.P. Chang, J. Eng, Jr., M. Du, Bell Labs, Lucent Technologies |
| 4:00pm | AS2-MoA7 Analytical Conditions for Semi-Quantitative Auger Analysis of TaN C.F.H. Gondran, SEMATECH, D.C. Nelsen, SEMATECH, on assignment from Intel, D.A. Hess, Evans Texas |
| 4:20pm | AS2-MoA8 Investigation of InP(110) Surface Damage Induced by Low Energy Ar and He Ion Bombardment Q. Zhao, The Chinese University of Hong Kong, P.R. China, Z.W. Deng, Tsinghua University, P.R. China, R.W.M. Kwok, W.M. Lau, The Chinese University of Hong Kong, P.R. China |
| 4:40pm | AS2-MoA9 Phase Transformation of Cubic Boron Nitride Induced by Ion Bombardment B. Zheng, R.W.M. Kwok, M.Y.Y. Hui, W.M. Lau, The Chinese University of Hong Kong, P.R. China |
| 5:00pm | AS2-MoA10 Guided Ion-beam Studies of Low Energy Cu@super +@ and Cu@sub 2@@super +@ Ion Interactions with Ni(100) S.L. Anderson, A. Lapicki, K.J. Boyd, M. Aizawa, University of Utah |