| AVS 45th International Symposium | |
| Manufacturing Science and Technology Group | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| MS-ThP1 Dynamic Simulation Based Learning Tools for Manufacturing Education and Training G.W. Rubloff, A.R. Rose, Y. Sankholkar, University of Maryland, D.E. Eckard, North Carolina State University |
| MS-ThP2 Surface Cleaning on Aluminum for UHV using Supercritical Fluid CO@sub 2@ including NaCl and H@sub 2@O as Impurities T. Momose, H. Yoshida, Miyagi National College of Technology, Japan, Z. Sherverni, T. Ebina, Y. Ikushima, National Industrial Research Institute of Tohoku, Japan |
| MS-ThP3 Design of Dynamic Simulation Experiments for Assessing Manufacturing Metrics R.Z. Shi, Z. Han, K. Moores, E. Li, Z. Chen, G.W. Rubloff, University of Maryland |
| MS-ThP4 Fluid Simulation of Distributed Gas Injection for Aluminum and Photoresist Etch D.F. Beale, N. Williams, Lam Research Corporation |
| MS-ThP6 Reaction Products in a-C:H Film Growth by DC Glow Discharges in the Novillo Tokamak R. Valencia, Instituto Nacional de Investigaciones Nucleares (ININ), México, J. de la Rosa, Instituto Politécnico Nacional, México, E. Camps, R. López, ININ, México |
| MS-ThP7 Physically-based Dynamic Simulation of a Tungsten CVD Cluster Tool J.N. Kidder, Jr., N. Gupta, G.W. Rubloff, University of Maryland |
| MS-ThP8 Computer Simulation of Three-Dimensional Asymmetries in Inductively Coupled Plasma Reactors T. Panagopoulos, V. Midha, D.J. Economou, University of Houston |
| MS-ThP9 Ion Beam Deposition Systems for Highly Uniform Defect-free Coatings for Electronic Manufacturing Applications A.V. Hayes, H. Hegde, V. Kanarov, C.C. Fang, J. Wang, D. Kania, Veeco Instruments, Inc. |
| MS-ThP10 Estimation of the Ion Energy Distribution Function at Sputter Coils in PVD-IMP Systems R. Veerasingam, P. Gopalraja, E Kim, J.C. Forster, Applied Materials, Inc. |