AVS 45th International Symposium
    Manufacturing Science and Technology Group Thursday Sessions
       Session MS-ThP

Paper MS-ThP9
Ion Beam Deposition Systems for Highly Uniform Defect-free Coatings for Electronic Manufacturing Applications

Thursday, November 5, 1998, 5:30 pm, Room Hall A

Session: Manufacturing Science and Technology Group Poster Session
Presenter: A.V. Hayes, Veeco Instruments, Inc.
Authors: A.V. Hayes, Veeco Instruments, Inc.
H. Hegde, Veeco Instruments, Inc.
V. Kanarov, Veeco Instruments, Inc.
C.C. Fang, Veeco Instruments, Inc.
J. Wang, Veeco Instruments, Inc.
D. Kania, Veeco Instruments, Inc.
Correspondent: Click to Email
Ion beam deposition (IBD) techniques are of increasing interest for use in the manufacturing of electronic devices. The most developed application is the production of high quality Extreme Ultraviolet (EUV) reticle masks.@footnote 1@ The IBD multilayer coatings generated by this work were very uniform, precisely deposited, and were lower in defects by several orders of magnitude compared to the best sputter deposited coatings. This has directly stimulated interest in extending the technique to the coating of advanced generation optical photomasks. On another front, recent advances have been made in the production of high quality Giant Magnetoresistive sensors using IBD methods. Such sensors are used in MRAM (Magnetic RAM) devices. In this work the ion beam deposition of low defect, uniform multilayer coatings with precisely controlled thickness, and of high quality magnetic films, is reviewed. This will be followed by a discussion of modeling and preliminary experimental data regarding extension of the technique for uniform coating of 300 mm substrates. @FootnoteText@ @footnote 1@S.P. Vernon, et al, Optical Society of America Trends in Optical Photronics, 4 (1996).