AVS 45th International Symposium
    Manufacturing Science and Technology Group Thursday Sessions
       Session MS-ThP

Paper MS-ThP10
Estimation of the Ion Energy Distribution Function at Sputter Coils in PVD-IMP Systems

Thursday, November 5, 1998, 5:30 pm, Room Hall A

Session: Manufacturing Science and Technology Group Poster Session
Presenter: R. Veerasingam, Applied Materials, Inc.
Authors: R. Veerasingam, Applied Materials, Inc.
P. Gopalraja, Applied Materials, Inc.
E Kim, Applied Materials, Inc.
J.C. Forster, Applied Materials, Inc.
Correspondent: Click to Email
Computer simulations were used to evaluate the ion energy distribution function (iedf) at the sputter coil of PVD-IMP systems. In the simulations, Ti/Ar and Ti/N2/Ar plasmas at 20 mTorr fill pressure were used to model the systems. The simulations revealed that in TiN systems, the plasma temperature and densities are lower compared to Ti systems. The existence of the excited states of nitrogen such as N* and N2*, provide an additional channel for electron energy dissipation rather than ionization and also lead to nitridization of surfaces. A TiN surface such as a nitridized sputter coil may have lower sputter yield compared to a pure Ti coil. By modifying the ion energy distribution function it is possible to enhance sputter yields from the coils. Control of the iedf at the coil surface provides a means to improve coil sputter and hence deposition uniformity. Experimental densities will be used to calculate the iedf. Results of the calculated plasma properties and iedfs will be presented.