AVS 45th International Symposium
    Applied Surface Science Division Monday Sessions

Session AS-MoA
Oxides and Insulators - Surface Characterization and Applications

Monday, November 2, 1998, 2:00 pm, Room 307
Moderator: R.E. Davis, IBM Corporation, East Fishkill Facility


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm AS-MoA1
Aqueous Leachability of Single Crystal and Polycrystalline Calcium Titanate
Z. Zhang, E.R. Vance, Australian Nuclear Sci. and Tech. Organisation
2:20pm AS-MoA2
XPS Investigations of the Chemistries of Soils
T.L. Barr, E.E. Hoppe, S. Hardcastle, University of Wisconsin, Milwaukee, S. Seal, University of Central Florida
2:40pm AS-MoA3 Invited Paper
Problems in Surface Characterization of Oxides and Insulators
J. Cazaux, University of Reims, France
3:20pm AS-MoA5
ESCA Depth Profiling of Insulating Thin Film Structures
J.S. Hammond, J.F. Moulder, D.J. Hook, Physical Electronics, Inc., H.M. Dunlop, Pechiney, Centre de Recherches de Voreppe, France
3:40pm AS-MoA6
Quantification of Nitrogen in Silicon Oxynitride Thin Films by XPS
J.R. Shallenberger, D.A. Cole, S.W. Novak, Evans East
4:00pm AS-MoA7
XPS Characterization of Nitrogen Profile and Chemical States in Ultrathin Silicon Oxynitrides
J.P. Chang, M.L. Green, V.M. Donnelly, R.L. Opila, Bell Laboratories, Lucent Technologies
4:20pm AS-MoA8
Ultra Shallow Depth Profiling by ESCA and SIMS
J.F. Moulder, S.R. Bryan, Physical Electronics, Inc.
4:40pm AS-MoA9
Valence Band X-ray Photoelectron Spectroscopic Studies to Distinguish Between Oxidized Aluminum Species
J.A. Rotole, P.M.A. Sherwood, Kansas State University
5:00pm AS-MoA10
Influence of Mg on the Oxide Formation on Al@footnote 1@
D.R. Baer, C.F. Windisch, Jr., M.H. Engelhard, M.J. Danielson, Pacific Northwest National Laboratory