AVS 64th International Symposium & Exhibition | |
Plasma Science and Technology Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:20pm | PS+VT-ThA1 Quantitative Analysis of Composition and Temperature of Semiconductor Processing Plasmas via Terahertz Spectroscopy Yaser Helal, C.F. Neese, F.C. De Lucia, The Ohio State University, A. Niabati, M. Johnson, B. Craver, P.J. Stout, M.D. Armacost, Applied Materials, Inc. |
2:40pm | PS+VT-ThA2 In Situ Measurement of Electron Emission Yields from Plasma-Exposed Surfaces Mark Sobolewski, National Institute of Standards and Technology |
3:00pm | PS+VT-ThA3 Invited Paper Studying Dynamic and Structured Plasma Systems Utilizing Laser-Collision Induced Fluorescence Edward Barnat, A. Fierro, Sandia National Laboratories |
4:00pm | PS+VT-ThA6 Effect of Ion Inertia on Ion Energy Broadness on Biased Electrode in Dual Frequency Capacitively Coupled Argon Plasma Yunchang Jang, H.-J. Roh, N.-K. Kim, S. Ryu, G.-H. Kim, Seoul National University, Republic of Korea |
4:20pm | PS+VT-ThA7 Collision Frequency Estimation using Microwave Hairpin Resonator Probes D. Peterson, Steven Shannon, North Carolina State University |
4:40pm | PS+VT-ThA8 Invited Paper In-Situ Diagnostics of Processing Plasma and Semiconductor Films for High-Efficiency Silicon Hetero-Junction Solar Cells Shota Nunomura, National Institute of Advanced Industrial Science and Technology (AIST), Japan |
5:20pm | PS+VT-ThA10 Towards In Situ Microwave Imaging in Plasmas A. Tselev, University of Aveiro, Portugal, J. Fagan, NIST, Andrei Kolmakov, CNST/NIST |
5:40pm | PS+VT-ThA11 Probe System for Radical Species Characterization in Vacuum with Centimeter Spatial Resolution Ivan Shchelkanov, D. Qerimi, A. Hayes, J.T. Wegner, D.N. Ruzic, University of Illinois at Urbana-Champaign |
6:00pm | PS+VT-ThA12 Spatiotemporal Evolution of RF Magnetic Field and Plasma Current in a Very High Frequency Plasma Source Jianping Zhao, P.L.G. Ventzek, B. Lane, C. Campbell, Tokyo Electron America, T. Iwao, K. Ishibashi, Tokyo Electron Limited |