AVS 64th International Symposium & Exhibition
    Plasma Science and Technology Division Thursday Sessions

Session PS+VT-ThA
Plasma Diagnostics, Sensors and Control

Thursday, November 2, 2017, 2:20 pm, Room 22
Moderator: Aranka Derzsi, Wigner Research Centre for Physics, Hungarian Academy of Sciences, Hungary


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:20pm PS+VT-ThA1
Quantitative Analysis of Composition and Temperature of Semiconductor Processing Plasmas via Terahertz Spectroscopy
Yaser Helal, C.F. Neese, F.C. De Lucia, The Ohio State University, A. Niabati, M. Johnson, B. Craver, P.J. Stout, M.D. Armacost, Applied Materials, Inc.
2:40pm PS+VT-ThA2
In Situ Measurement of Electron Emission Yields from Plasma-Exposed Surfaces
Mark Sobolewski, National Institute of Standards and Technology
3:00pm PS+VT-ThA3 Invited Paper
Studying Dynamic and Structured Plasma Systems Utilizing Laser-Collision Induced Fluorescence
Edward Barnat, A. Fierro, Sandia National Laboratories
4:00pm PS+VT-ThA6
Effect of Ion Inertia on Ion Energy Broadness on Biased Electrode in Dual Frequency Capacitively Coupled Argon Plasma
Yunchang Jang, H.-J. Roh, N.-K. Kim, S. Ryu, G.-H. Kim, Seoul National University, Republic of Korea
4:20pm PS+VT-ThA7
Collision Frequency Estimation using Microwave Hairpin Resonator Probes
D. Peterson, Steven Shannon, North Carolina State University
4:40pm PS+VT-ThA8 Invited Paper
In-Situ Diagnostics of Processing Plasma and Semiconductor Films for High-Efficiency Silicon Hetero-Junction Solar Cells
Shota Nunomura, National Institute of Advanced Industrial Science and Technology (AIST), Japan
5:20pm PS+VT-ThA10
Towards In Situ Microwave Imaging in Plasmas
A. Tselev, University of Aveiro, Portugal, J. Fagan, NIST, Andrei Kolmakov, CNST/NIST
5:40pm PS+VT-ThA11
Probe System for Radical Species Characterization in Vacuum with Centimeter Spatial Resolution
Ivan Shchelkanov, D. Qerimi, A. Hayes, J.T. Wegner, D.N. Ruzic, University of Illinois at Urbana-Champaign
6:00pm PS+VT-ThA12
Spatiotemporal Evolution of RF Magnetic Field and Plasma Current in a Very High Frequency Plasma Source
Jianping Zhao, P.L.G. Ventzek, B. Lane, C. Campbell, Tokyo Electron America, T. Iwao, K. Ishibashi, Tokyo Electron Limited