AVS 64th International Symposium & Exhibition | |
Plasma Science and Technology Division | Thursday Sessions |
Session PS+VT-ThA |
Session: | Plasma Diagnostics, Sensors and Control |
Presenter: | Jianping Zhao, Tokyo Electron America |
Authors: | J.P. Zhao, Tokyo Electron America P.L.G. Ventzek, Tokyo Electron America B. Lane, Tokyo Electron America C. Campbell, Tokyo Electron America T. Iwao, Tokyo Electron Limited K. Ishibashi, Tokyo Electron Limited |
Correspondent: | Click to Email |
Large-area plasma processing systems capacitively driven at very high frequencies (VHF, e.g. 100MHz) have attracted much interest for semiconductor device and flat panel display processing. VHF has the advantage of generating plasma with more efficiency as power is coupled more into electrons and less into ions in the sheath. Benefits are seen for processes requiring reduced ion bombardment energy, ostensibly to minimize damage, high ion and radical flux to the substrate. The benefits of VHF are accompanied by challenges. The short wavelength associated with VHF source power is reduced even further in the presence of high density plasma. The wavelengths are comparable to the RF electrode dimension. High plasma densities can also lead to skin effects that screen the electromagnetic fields from parts of the plasma. As a result, spatial variations in plasma density and sheath voltage can arise and lead to undesired non-uniformities in process parameters such as etch or deposition rate. E to H transitions and plasma-sheath local resonances are other potential destroyers of plasma uniformity. Resonances and mode jumping can potentially prevent smooth plasma property control through adjustable process parameter changes. In order to understand these fundamental electromagnetic effects on VHF plasma non-uniformity to achieve a better design of plasma source, it is desired to have a detailed investigation on the spatial and temporal evolution of RF magnetic field and plasma current spanning a large RF power, pressure, and chemistry range. We present here a time and phase resolved measurements of the spatial structure of the electromagnetic waves in a 100MHz plasma source performed with a magnetic field probe (B-dot loop). The probe was translated across the diameter of the VHF plasma, measuring the magnitude and phase of the fundamental and harmonics of the plasma excitation frequency as a function of radial position. The measured magnetic fields displayed a transition from simple to complex behaviors depending on plasma conditions. The spatiotemporal resolved magnetic field exhibits a series of fast current reversal and subsequent circulation driven by inward wave propagation that are electromagnetic in nature. We show how the onset, frequency and amplitude of the current reversal and subsequent circulation are strongly related to applied plasma conditions (e.g., density, sheath thickness). We also show that plasma current derived from the magnetic field distribution is closely correlated to the plasma density profile measured by a plasma absorption probe.