| AVS 62nd International Symposium & Exhibition | |
| Helium Ion Microscopy Focus Topic | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | HI+AS+SS+NS-ThM1 Ga+ Ion Beam Nanofabrication Techniques of 3D Micro- and Nano- Fluidic Devices Leonidas Ocola, Argonne National Laboratory |
| 8:20am | HI+AS+SS+NS-ThM2 Adding 3D to Conventional SEM or FIB Surface Imaging Information - In situ Surface Sensing and Nanoprofilometry for Focused Electron and Ion Beam Induced Processes Verification Andre Linden, Raith America, Inc., A. Rudzinski, M. Levermann, T. Michael, Raith GmbH, E. Maynicke, RWTH Aachen |
| 8:40am | HI+AS+SS+NS-ThM3 Invited Paper Nanofabrication Using Gas-Assisted Focused Ion Beams Chad Rue, FEI Company |
| 9:20am | HI+AS+SS+NS-ThM5 The Psychology and Applications of a Bipolar Plasma Focused Ion Beam Rod Boswell, ANU, Australia, N. Smith, P. Tesch, N. Martin, Oregon Physics |
| 9:40am | HI+AS+SS+NS-ThM6 Advanced FIB Applications with New Ion Species and Large Area Capabilities Sven Bauerdick, L. Bruchhaus, Raith GmbH, Germany, J. Fridmann, Raith America, Inc., P. Mazarov, A. Nadzeyka, R. Jede, Raith GmbH, Germany |
| 11:00am | HI+AS+SS+NS-ThM10 Invited Paper SIMS on the Helium Ion Microscope : a Powerful Tool for High-resolution High-sensitivity Nano-Analytics Tom Wirtz, D. Dowsett, Luxembourg Institute of Science and Technology (LIST), Luxembourg, S. Sijbrandij, Carl Zeiss Microscopy |
| 11:40am | HI+AS+SS+NS-ThM12 Nanometer TOF-RBS and TOF-SIMS in a Helium/Neon Ion Microscope Nico Klingner, R. Heller, G. Hlawacek, S. Facsko, J. von Borany, Helmholtz-Zentrum Dresden - Rossendorf, Germany |
| 12:00pm | HI+AS+SS+NS-ThM13 Improving Pattern Fidelity in Helium Ion Beam Lithography using Pixel Dose Optimization N. Kalhor, TU Delft, Netherlands, W. Mulckhuyse, TNO Technical Sciences, Netherlands, Paul Alkemade, TU Delft, Netherlands, D. Maas, TNO Technical Sciences, Netherlands |