AVS 62nd International Symposium & Exhibition
    Helium Ion Microscopy Focus Topic Thursday Sessions
       Session HI+AS+SS+NS-ThM

Paper HI+AS+SS+NS-ThM5
The Psychology and Applications of a Bipolar Plasma Focused Ion Beam

Thursday, October 22, 2015, 9:20 am, Room 211B

Session: Focused Ion Beam Technology (08:00-10:00)/Fundamentals of Helium Ion Microscopy (11:00-12:20)
Presenter: Rod Boswell, ANU, Australia
Authors: R. Boswell, ANU, Australia
N. Smith, Oregon Physics
P. Tesch, Oregon Physics
N. Martin, Oregon Physics
Correspondent: Click to Email
A new high brightness ion source has been developed using bi-polar power supplies that can be used with either positive or negative ions. This has involved a redesign of the plasma source and the acceleration optics to allow high currents to be focused with an energy of up to 30kV. We expect to make significant advances in Ultra High Resolution SIMS with a negative oxygen beam; a second application is the milling of structures in glass with a O- beam, such as a microfluidic set of channels. At the higher voltages mentioned above, it should be possible to cut cross sections of Through Silicon Vias in glass substrates. The challenges encountered in creating and extracting the negative ions will be discussed along with some performance and application data.