AVS 62nd International Symposium & Exhibition
    Helium Ion Microscopy Focus Topic Thursday Sessions
       Session HI+AS+SS+NS-ThM

Paper HI+AS+SS+NS-ThM1
Ga+ Ion Beam Nanofabrication Techniques of 3D Micro- and Nano- Fluidic Devices

Thursday, October 22, 2015, 8:00 am, Room 211B

Session: Focused Ion Beam Technology (08:00-10:00)/Fundamentals of Helium Ion Microscopy (11:00-12:20)
Presenter: Leonidas Ocola, Argonne National Laboratory
Correspondent: Click to Email

Three-dimensional (3D) fluidic geometries have been fabricated in the past by using several layers of Polydimethylsiloxane (PDMS) molds or double-sided Si etch steps [1], which require highly accurate chip bonding to complete the fluid path and multiple process steps. An alternative to this method is the use of direct write ion beam micromachining as a means to fabricate key components of a microfluidic device that require variations in depth as well as variations in width. 3-D microfabrication currently is mainly constrained to excimer lasers [2-3] and therefore is inherently diffraction limited. Grey scale lithography is also used for 3D structures but has limited capability. On the other hand, ion beam micromachining can scale down below the diffraction limit with no change in the technique and almost unlimited depth bandwidth. The focused ion beam / scanning electron microscope (FIB/SEM) is a powerful tool used for sample analysis and characterization. When equipped with a sophisticated pattern generator and lithography technology it can expand its use to new applications in nano- and micro-fabrication. Ion beam micromachining is akin to electron beam lithography, where a beam of charged particles are steered to draw structures contained in a computer aid design (CAD) file. Unlike electron beam lithography, one can program arbitrary depths by manipulating the dwell time, or dose, of a particular structure. In this paper the work reported previously [4-5] has been expanded to large and complex geometries to place emphasis on the applicability of ion beam micromachining to practical microfluidic applications, such as straight 3D mixers and serpentine 3D mixers with sections as deep as 70 microns and channel widths as large as 30 microns. We have found that these devices can achieve full mixing of aqueous solutions in about an order of magnitude faster than traditional devices. The challenges encountered and overcome to fabricate these mixers will be described and the scalability of different fabrication techniques to nano-fluidics will be revisited.

References:

1. R. H. Liu et al., J. MEMS 9 (2000) 190

2. Y. Liao et al., Lab Chip, 12 (2012) 746

3. A. Ródenas et al., Proc. SPIE 8542 (2012) 854217

4. A. Imre et al., J. Vac. Sci. & Technol. B 28 (2010) 304

5. E. Palacios et al., J. Vac. Sci. Technol. B 28 (2010) C6I1

Use of the Center for Nanoscale Materials, Argonne National Laboratory was supported by the U. S. Department of Energy, Office of Science, Office of Basic Energy Sciences, under Contract No. DE-AC02-06CH11357.