| AVS 58th Annual International Symposium and Exhibition | |
| Plasma Science and Technology Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS-MoM1 Impact of Synchronized Plasma Pulsing Technologies on Key Parameters Governing STI Etch Processes Moritz Haass, M. Darnon, G. Cunge, P. Bodart, C. Petit-Etienne, M. Brihoum, L. Vallier, LTM-CNRS, France, S. Banna, Applied Materials, Inc., O. Joubert, LTM-CNRS, France |
| 8:40am | PS-MoM2 Effect of Si Damage on Shallow Source-Drain (SSD) Recess Structures Joydeep Guha, S. Sriraman, Lam Research Corporation |
| 9:00am | PS-MoM3 Invited Paper Improving Etch Processes by using Pulsed Plasmas Maxime Darnon, M. Haass, P. Bodart, G. Cunge, C. Petit-Etienne, M. Brihoum, R. Blanc, CNRS-LTM, France, T. David, Cea Leti Minatec Campus, France, E. Pargon, L. Vallier, O. Joubert, CNRS-LTM, France, S. Banna, T. Lill, Applied Materials, Inc. |
| 9:40am | PS-MoM5 HfO2 Etching by Pulsed BCl3/Ar Plasma Paul Bodart, C. Petit-Etienne, G. Cunge, F. Boulard, M. Darnon, L. Vallier, E. Pargon, CNRS-LTM, France, S. Banna, T. Lill, Applied Materials, Inc., O. Joubert, CNRS-LTM, France |
| 10:00am | PS-MoM6 Study of Metallic Interfaces Etching for High-K Metal Gate stacks in CMOS 28 nm Technology Florian Chave, STMicroelectronics, France, L. Vallier, CNRS-LTM, France, P. Gouraud, C. Vérove, STMicroelectronics, France, O. Joubert, CNRS-LTM, France |
| 11:00am | PS-MoM9 Double Patterning Challenges for the sub 22nm CMOS Nodes Sivananda Kanakasabapathy, R. Jung, M. Hartig, S. Schmitz, Y. Yin, IBM Research, S. Raghunathan, L. Jang, GlobalFoundries, E. McLellan, S. Burns, S. Holmes, C.S. Koay, IBM Research, R.H. Kim, GlobalFoundries, G. Landie, ST Microelectronics, D. Horak, IBM Research, Y. Mignot, ST Microelectronics, S. Seo, S.T. Chen, J. Arnold, M. Colburn, B. Haran, IBM Research |
| 11:20am | PS-MoM10 Novel Etch Mechanism for High Selectivity Etching of Silicon Nitride over Silicon and Silicon Oxide for Spacer Applications Sebastian Engelmann, J. Chang, E.A. Joseph, R.L. Bruce, N.C.M. Fuller, W.S. Graham, E.M. Sikorski, S. Balakrishnan, A. Banik, M. Gordon, IBM T.J. Watson Research Center, M. Nakamura, G. Matsuura, ZEON Chemicals L.P., H. Matsumoto, A. Itou, Zeon Corporation |
| 11:40am | PS-MoM11 High-Aspect Silicon Trench Oxidation in Downstream of Surface-wave Oxygen Plasma Y. Taniuchi, Haruo Shindo, Tokai University, Japan |