| AVS 55th International Symposium & Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS2-WeM1 Invited Paper Generating Short Wavelength Light from Compact Sources - Challenges and Applications W. Holber, S. Horne, M. Partlow, J. Silterra, D. Smith, J. Ye, H. Zhu, Energetiq Technology, Inc. |
| 8:40am | PS2-WeM3 3-Dimensional Model for Magnetized Capacitively Coupled Plasma Discharges S. Rauf, J.A. Kenney, K. Collins, Applied Materials, Inc. |
| 9:00am | PS2-WeM4 Effects of Very High Frequency Source Mixing and Inter-electrode Gap on Plasma Characteristics K. Bera, S. Rauf, K. Ramaswamy, K. Collins, Applied Materials, Inc. |
| 9:20am | PS2-WeM5 The Impact of Electrode Gap and Gas Injection on Plasma Etch Uniformity G.M. Amico, M. Block, S. Sirard, J. Guha, A. Leming, A. Marakhtanov, E.A. Hudson, M. Srinivasan, Lam Research |
| 9:40am | PS2-WeM6 2 m Long-Line Plasma Production by Evanescent Microwave in a Narrowed Rectangular Waveguide H. Shindo, Y. Kimura, Tokai University, Japan |
| 10:40am | PS2-WeM9 Development and Characterization of a Radical Beam Source Based on Surface Waves for Plasma-Surface Reaction Studies R. Khare, University of Houston, L. Stafford, Université de Montréal, Canada, J. Guha, V.M. Donnelly, University of Houston |
| 11:00am | PS2-WeM10 Production-Worthy Pulsed ICP Plasma Processes S. Banna, V. Todorow, K. Ramaswamy, A. Agarwal, S. Rauf, K. Collins, Applied Materials, Inc. |
| 11:20am | PS2-WeM11 Two Cannel Filtered Vacuum-arc Plasma Source for Composite Coatings Deposition I.I. Aksenov, D.S. Aksyonov, V.V. Vasilyev, A.A. Luchaninov, E.N. Reshetnyak, V.E. Strel´nitskij, NSC "Kharkov Institute of Physics and Technology", Ukraine |