| AVS 55th International Symposium & Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
| Session PS2-WeM |
| Session: | Plasma Sources |
| Presenter: | V.E. Strel´nitskij, NSC "Kharkov Institute of Physics and Technology", Ukraine |
| Authors: | I.I. Aksenov, NSC "Kharkov Institute of Physics and Technology", Ukraine D.S. Aksyonov, NSC "Kharkov Institute of Physics and Technology", Ukraine V.V. Vasilyev, NSC "Kharkov Institute of Physics and Technology", Ukraine A.A. Luchaninov, NSC "Kharkov Institute of Physics and Technology", Ukraine E.N. Reshetnyak, NSC "Kharkov Institute of Physics and Technology", Ukraine V.E. Strel´nitskij, NSC "Kharkov Institute of Physics and Technology", Ukraine |
| Correspondent: | Click to Email |
The new two-cathode filtered vacuum arc plasma source is considered. The source contains two plasma generators with magnetic stabilization of an arc and focusing of a plasma stream. For removal of macroparticles from plasma generated the two-channel magnetic filter with T-shaped plasma duct is used. When both generators are simultaneously in operation the plasma streams emitted by them go through the entrance sections of the plasma duct into its exit section, and are transported up to a substrate. By means of a flat matrix probe the measurements of an ion current and its density distribution at the output plasma stream cross-section have been carried out. The ion current at the filter exit strongly depends on intensity and geometry of magnetic fields in the plasma guiding channels and on pressure of argon gas in the system. At arc current of 100 A of each generator the output ion current was 5.5 A. At creation of an acute-angled magnetic fields distribution with the annular cusp near the filter exit, the conditions providing leveling of the ion current density distribution at the probe surface and thickness of the condensed film distribution along the substrate surface were attained. When both generators with the cathodes of different materials (Al and Ti) were simultaneously in operation, coatings with rather homogeneous composition were grown at the motionless flat substrate of 60 mm in diameter. Aluminum percentage dispersion was about 70 %. At operation of only one generator the output plasma stream density distribution was strongly asymmetrical. The leveling and balancing of the distribution in this case also was reached by creation of the acute angle magnetic film at the system exit. At use of composite cathodes (Ti, Si) the structure of condensate deposited was non-uniform. Leveling of the components concentration distribution on a spot of condensation was reached choosing the argon pressure in the system and the substrate negative bias voltage. The gained results of researches are rather perspective for growth of high-quality composite coatings including nanostructural.