| AVS 55th International Symposium & Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
| Session PS2-WeM |
| Session: | Plasma Sources |
| Presenter: | W. Holber, Energetiq Technology, Inc. |
| Authors: | W. Holber, Energetiq Technology, Inc. S. Horne, Energetiq Technology, Inc. M. Partlow, Energetiq Technology, Inc. J. Silterra, Energetiq Technology, Inc. D. Smith, Energetiq Technology, Inc. J. Ye, Energetiq Technology, Inc. H. Zhu, Energetiq Technology, Inc. |
| Correspondent: | Click to Email |
Across a range of scientific and technological applications, there is a need for more capable short-wavelength light sources. In semiconductor manufacturing, critical dimensions are now in the nanometer range and EUV at 13.5 nm is under active investigation as a lithography source. In biotechnology, structural information on proteins requires UV down to 170 nm and internal cellular features are imaged using 2.3-4.3 nm radiation. Lasers can produce significant amounts of light at specific wavelengths in the UV, but do not provide broad wavelength coverage either in the UV or soft x-ray spectral regions. Synchrotrons are a source of bright, incoherent radiation at wavelengths from hard x-ray through DUV, but are based in large, centralized facilities. Incoherent light sources that are lab-based provide an alternative to synchrotrons in a growing number of applications. We will present results from a compact z-pinch plasma source customizable to different wavelengths in the EUV and SXR1 range, generating up to 10 Watts of power at 13.5 nm, and a laser-driven lamp source of light from 170 to 800 nm. Both provide uniquely bright output over a range of applications.
1 Work on SXR sources funded in part by NIH Grants 5R44RR022488-03 and 5R44RR023753-03.