| AVS 55th International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| PS-ThP1 Time-Modulated Etching in a Dual-Frequency Capacitively Coupled Fluorocarbon Plasma S. Jeong, D. Sung, K. Kim, A. Ushakov, M. Park, S. Cho, S. Kim, H. Park, SAMSUNG ELECTRONICS, South Korea |
| PS-ThP2 In-situ Plasma Diagnostics Study of a Commercial High Power Hollow Cathode Magnetron (HCM) Deposition Tool R. Raju, L. Meng, H. Shin, D.N. Ruzic, University of Illinois at Urbana-Champaign |
| PS-ThP3 Optical and Electrical Diagnostics of an rf-Capacitively Coupled Plasma H.W. Chang, C.C. Hsu, National Taiwan University |
| PS-ThP4 Characterization of Dual Frequency Capacitively-Coupled Oxygen Plasmas by Trace Rare Gases–optical Emission Spectroscopy (TRG-OES) Z. Chen, V.M. Donnelly, D.J. Economou, University of Houston, L. Chen, M. Funk, R. Sundararajan, Tokyo Electron America, Inc. |
| PS-ThP5 Synthesis of Single-Walled Carbon Nanotubes by Oxygen-Assisted Plasma Enhanced Chemical Vapor Deposition S.W. Huang, C.H. Hsiao, K.-C. Leou, C.-H. Tsai, National Tsing Hua University, Taiwan |
| PS-ThP6 Characterization of Platinum Catalyst Supported on Carbon Nanoballs Prepared by Solution Plasma Processing Y. Ichino, K. Mitamura, N. Saito, O. Takai, Nagoya University, Japan |
| PS-ThP7 Effect of Dissolved Gases and Ions onto Solution Plasma Fields N. Fujikawa, N. Saito, O. Takai, Nagoya University, Japan |
| PS-ThP8 Organic Compounds Synthesized by Short-Pulsed Discharge in Aqueous Solution T. Mori, K. Mitamura, N. Saito, O. Takai, Nagoya University, Japan |
| PS-ThP9 Excited Species by Shorter-Pulsed Electrical Discharges in Aqueous Solutions: Effect of Electrodes with Low Work Function C. Miron, M.A. Bratescu, N. Saito, O. Takai, Nagoya University, Japan |
| PS-ThP10 Effects of Vacuum-Ultraviolet Radiation on the Plasma-Induced Charging of Patterned-Dielectric Materials G.S. Upadhyaya, J.L. Shohet, University of Wisconsin-Madison |
| PS-ThP11 How Far Should Be for Being Remote Plasma? Y. Kim, W.K. Yang, J.H. Joo, Kunsan National University, Korea |
| PS-ThP12 Real Time Feedback Control of Plasma Density by using a Floating Probe in Inductively Coupled Plasmas S.H. Jang, M.H. Lee, C.W. Chung, Hanyang University, Republic of Korea |
| PS-ThP13 Time Resolved Measurements of the Electron Density with a Cutoff Probe in a Pulsed Plasma J.-H. Kim, S.J. You, Korea Research Institute of Standards and Science, B.-K. Na, Korea Advanced Institute of Science and Technology, D.-J. Seong, Y.-H. Shin, Korea Research Institute of Standards and Science |