| AVS 55th International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
| Session PS-ThP |
| Session: | Plasma Science Poster Session |
| Presenter: | J.-H. Kim, Korea Research Institute of Standards and Science |
| Authors: | J.-H. Kim, Korea Research Institute of Standards and Science S.J. You, Korea Research Institute of Standards and Science B.-K. Na, Korea Advanced Institute of Science and Technology D.-J. Seong, Korea Research Institute of Standards and Science Y.-H. Shin, Korea Research Institute of Standards and Science |
| Correspondent: | Click to Email |
In pulse-modulated capacitively coupled plasmas generated in Ar/CF4 mixtures, time variations of the electron density were measured with a cutoff probe. For measuring the cutoff frequency, a microwave is introduced through a radiating antenna to the plasma, and the transmitted wave is detected on a receiving antenna connected to a port of an oscilloscope. From the transmission spectrum we obtained the wave cutoff frequency, which could directly give the electron density. To measure the time variation of cutoff frequency, we scanned the transmitted signal with time for a fixed frequency, which was done for next fixed frequency and so on. Thus, we accumulated the time variations of the transmitted signal data for each different frequency and transposed the data array. Therefore, we obtained the time variation of the cutoff frequency. We investigated the decay time of the electron density for different pressures, repetition frequencies of the pulse modulation, and duty ratios.