| AVS 54th International Symposium | |
| Nanometer-scale Science and Technology | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | NS-FrM1 Invited Paper Stencil Lithography - Quick & Clean Surface Patterning at Mesoscopic Scales J. Brugger, Swiss Federal Institute of Technology (EPFL), Switzerland |
| 8:40am | NS-FrM3 Nanopatterning of Functional Polymers by Thermal Dip-Pen Nanolithography W.K. Lee, P.E. Sheehan, U.S. Naval Research Laboratory, W.P. King, University of Illinois, Urbana-Champaign, L.J. Whitman, U.S. Naval Research Laboratory |
| 9:00am | NS-FrM4 Shadow Edge Lithography for Wafer-Scale Nanomanufacturing J. Bai, J.-H. Chung, University of Washington |
| 9:20am | NS-FrM5 Conformal Intermediate Layers for Anti-Adhesive Coatings on Metal Molds H. Schift, Paul Scherrer Institute, Switzerland, S. Bellini, ETH Zürich, Switzerland, H. Sehr, J. Gobrecht, Paul Scherrer Institute, Switzerland |
| 9:40am | NS-FrM6 Nanoscale Electron Beam Induced Etching (EBIE) M.G. Lassiter, D. Smith, University of Tennessee, T. Liang, Intel Corporation, P.D. Rack, University of Tennessee |
| 10:00am | NS-FrM7 Invited Paper Atomic-Scale Device Fabrication in Silicon M.Y. Simmons, University of New South Wales, Australia |
| 10:40am | NS-FrM9 Advances in Atom Beam Nanolithography: A New Exposure Tool, Masks, and Resists B. Craver, H. Guo, A. Roy, University of Houston, J. Strahan, University of Texas, J. Reynolds, H. Nounu, University of Houston, C.G. Willson, University of Texas, J.C. Wolfe, University of Houston |
| 11:00am | NS-FrM10 Resonances in Secondary Electron Yields from Capped Multilayer Mirrors E. Loginova, B. Yakshinskiy, Rutgers University, S. Yulin, T. Feigel, Fraunhofer Institut (IOF), Germany, J. Keister, Brookhaven National Laboratory, T. Lucatorto, C. Tarrio, S. Hill, National Institute of Standards and Technology, O. Dulub, U. Diebold, Tulane University, M. Chandok, M. Fang, Intel Corporation, T.E. Madey, Rutgers University |
| 11:20am | NS-FrM11 Invited Paper Miniature Machines for Nano-Scale Research and Manufacturing: A New Model for Equipment and Instrumentation M.L. Culpepper, Massachusetts Institute of Technology |