| AVS 66th International Symposium & Exhibition | |
| Advanced Surface Engineering Division | Wednesday Sessions |
| Session SE+AS+TF-WeA |
| Session: | Nanostructured Thin Films and Coatings |
| Presenter: | Sarah Hashemi Astaneh, University of Illinois at Chicago |
| Authors: | S. Hashemi Astaneh, University of Illinois at Chicago C. Sukotjo, University of Illinois at Chicago C.G. Takoudis, University of Illinois at Chicago |
| Correspondent: | Click to Email |
Two types of samples were prepared in this work:
1- Silver coated PDMS
2- Silver coated PDMS with interlayer of TiO2
For type 1 samples: Silver deposition was done in the costume-built ALD system. (Ag(fod) (Pet3)) was used as a silver precursor and dimethyl amineborane ((BH3 (NHMe2)) was used as a reducing agent. Silver bubbler and dimethyl amineborane bubbler temperatures were kept at 96 °C and 50 °C, respectively. The reactor pressure and temperature was kept at 500 mtorr and 115 ˚C during deposition, respectively.
For type 2 samples: prior to silver coating, deposition of TiO2 on PDMS was done in a commercial ALD system (Kurt J. Lesker 150 LE). Tetrakis (dimethylamido) titanium (IV) (TDMAT™) was used as the metal oxide precursor and maintained at 70 °C in the bubbler during all depositions. Ultra high purity N2 was used as a carrier gas as well as purging gas. O3 was used as an oxidizer for this ALD reaction and it was prepared using a UV-ozone generator placed immediately upstream of the deposition chamber to reduce ozone decomposition in delivery line as described in our previous studies. The reactor pressure and temperature was kept at ~1000 mtorr and 120 ˚C during TiO2 deposition. This process leads to ~9 nm of TiO2 interlayer on PDMS.
Right after this step, TiO2 coated PDMS samples were transferred to the custom-built ALD system and silver deposition was carried on in the costume-built ALD system similar to type 1 samples.
In each of the above runs, simultaneously; same thin film was deposited on p-type Si (100) silicon wafer (University wafer Inc, USA) and used as a reference substrate to determine deposited film thickness.
The growth and composition of the silver on top of PDMS samples were analyzed with X-ray photoelectron spectroscopy (XPS) using Kratos AXIS-165 equipped with monochromatic Al Kα X-ray source operating at 15kV and 10 mA. As can be seen in figure 1, Ag 3p, Ag 3d peaks appeared clearly on Si, TiO2 coated Si and TiO2 coated PDMS substrates.