| AVS 66th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS2-MoM1 Computational Modeling of Capacitively Coupled Plasmas at Moderate Pressures in gases of Argon, Helium and Nitrogen Wei Tian, Applied Materials, D. Peterson, S.C. Shannon, North Carolina State University, S. Rauf, Applied Materials |
| 8:40am | PS2-MoM2 Relation between Atomic Interaction Parameters of a Surface Material and its Physical Sputtering Yield; How to Predict the Etching Rate based on the Surface Material Properties Nicolas Mauchamp, M. Isobe, S. Hamaguchi, Osaka University, Japan |
| 9:00am | PS2-MoM3 Invited Paper Investigation on the Uniformity Control of the Electron and the Ion Kinetics in a Capacitively Coupled Plasma Reactor using a Parallelized Particle-in-Cell Simulation Hae June Lee, Pusan National University, Republic of Korea, H.J. Kim, Dong A Uiversity, Republic of Korea, J.S. Kim, Tokyo Electron Technology Solutions Limited, Japan |
| 9:40am | PS2-MoM5 Capacitively Coupled Plasma Uniformity Improvement Using Phase and Amplitude Control of Electrode Potential Xiaopu Li, K. Bera, S. Rauf, Applied Materials |
| 10:00am | PS2-MoM6 Kinetic Modeling of Non-Equilibrium Plasmas for Modern Applications Igor Kaganovich, A. Khrabrov, A. Powis, Princeton Plasma Physics Laboratory |
| 10:40am | PS2-MoM8 Automated Reduction of Plasma Chemistry Sets Sebastian Mohr, Quantemol Ltd., UK, M. Hanicinec, University College London, UK, A. Dzarasova, Quantemol Ltd., UK, J. Tennyson, University College London, UK |
| 11:00am | PS2-MoM9 Prediction of Etch Rates for New Materials by Machine Learning - Case Study for Physical Sputtering Kazumasa Ikuse, Osaka University, Japan, H. Kino, National Institute for Materials Science (NIMS), Japan, S. Hamaguchi, Osaka University, Japan |
| 11:20am | PS2-MoM10 Maskless and Contactless Patterned Silicon Deposition using a Localized PECVD Process Ronan Leal, B. Bruneau, P. Bulkin, T. Novikova, F. Silva, LPICM, CNRS, Ecole Polytechnique, Institut Polytechnique de Paris, France, N. Habka, TOTAL GRP - New Energies, France, E.V. Johnson, LPICM, CNRS, Ecole Polytechnique, Institut Polytechnique de Paris, France |