| AVS 66th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS-ThM1 Measurement of Plasma Neutral Densities in a Very High Frequency Ar/NH3 Plasma with a Line-of-sight Threshold Ionization Mass Spectrometry Jianping Zhao, P.L.G. Ventzek, C. Schlechte, M. Burtner, Tokyo Electron America, Inc., D. Li, J.G. Ekerdt, The University of Texas at Austin, T. Iwao, K. Ishibashi, Tokyo Electron Technology Solutions Limited, Japan |
| 8:20am | PS-ThM2 Radical Probe System for In-Situ Measurements of Hydrogen, Oxygen and Nitrogen Radical Densities Dren Qerimi, G.A. Panici, A.J. Jain, University of Illinois at Urbana-Champaign, J.W. Wagner, Colorado State University, D.N. Ruzic, University of Illinois at Urbana-Champaign |
| 8:40am | PS-ThM3 Post Charge Separation Grid Ion Flux Evaluation in Inductive Coupled Plasma Source Downstream Asher Luke Zhang, S. Ma, Mattson Technology, Inc. |
| 9:00am | PS-ThM4 Development of a Novel Langmuir Probe for the Investigation of Dusty Non-thermal Plasmas Austin Woodard, L. Mangolini, K. Shojaei, C. Berrospe, University of California, Riverside |
| 9:20am | PS-ThM5 Invited Paper Historical Review of Microwave Plasma Diagnostics using Plasma Cutoff Phenomenon Shin-Jae You, S.J. Kim, Chungnam National University, Republic of Korea, Dw. Kim, KIMM, Republic of Korea |
| 11:00am | PS-ThM10 Characterization of Inductive Coupled Plasma Source RF Power Pulsing for Advanced Surface Treatment Applications Shawming Ma, L. Zhang, D. Kohl, Mattson Technology, Inc. |
| 11:20am | PS-ThM11 In-situ Measurement of Deposited Tilm Thickness and Electron Density by Double Curling Probe Daisuke Ogawa, Chubu University, Japan, Y. Sakiyama, Lam Research Corporation, K. Nakamura, Chubu University, Japan, H. Sugai, Nagoya Industrial Science Research Institute, Japan |
| 11:40am | PS-ThM12 Study of Selective PECVD of Silicon on Silicon Nitride and Aluminum Oxide Ghewa Akiki, E.V. Johnson, P. Bulkin, LPICM, CNRS, Ecole Polytechnique, Institut Polytechnique de Paris, France, D. Daineka, LPICM, CNRS, Ecole Polytechnique, Institut Polytechnique de Paris |