| AVS 66th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS+EM-TuM1 Invited Paper Investigation on Plasma Etch Technology Enabling Si/SiGe MOSFET Process Integration Yohei Ishii, Hitachi High Technologies America Inc., Y.-J. Lee, W.-F. Wu, Taiwan Semiconductor Research Institute, Taiwan, Republic of China, R. Sugano, Hitachi, Ltd., Japan, K. Maeda, Hitachi High Technologies America Inc., H. Ishimura, Hitachi High-Technologies Taiwan Corp., Taiwan, Republic of China, M. Miura, Hitachi High Technologies, Japan |
| 8:40am | PS+EM-TuM3 Etching of Sub-10 nm Half-pitch High Chi Block Copolymers for Directed Self-Assembly (DSA) Application Maria Gabriela Gusmão Cacho, P. Pimenta-Barros, K. Benotmane, A. Gharbi, M. Argoud, CEA-LETI, France, C. Navarro, Arkema France, K. Sakavuyi, Brewer Science Inc., R. Tiron, N. Possémé, S. Barnola, CEA-LETI, France |
| 9:00am | PS+EM-TuM4 Mechanism of Highly Selective SiCN Etchings Using NF3/Ar-based Gases Miyako Matsui, Hitachi Ltd., Japan, K. Kuwahara, Hitachi High-Technologies Corp., Japan |
| 9:20am | PS+EM-TuM5 Impact of Plasma Process on Source/Drain Epitaxy Film Yun Han, B. Messer, M. Sapel, H. Kim, Y. Shi, M. Wang, Y. Trickett, K. Maekawa, TEL Technology Center, America, LLC, K. Taniguchi, S. Morikita, Tokyo Electron Miyagi Ltd., Japan, A. Metz, P. Biolsi, TEL Technology Center, America, LLC |
| 9:40am | PS+EM-TuM6 CCP Dry Clean Process Development Using Quadrupole Mass Spectrometer and Optical Emission Spectroscopy Harutyun Melikyan, A.D. Martinez, S.C. Pandey, M. Koltonski, G. Sandhu, Micron Technology |
| 11:00am | PS+EM-TuM10 Surface Reaction of Atomic Hydrogen with SiGe Surface Compared with Si Through Ab-initio Calculations Ryoko Sugano, Hitachi, Ltd., Japan, Y. Ishii, K. Maeda, Hitachi High Technologies America Inc., M. Miura, K. Kuwahara, Hitachi High Technologies, Japan |
| 11:20am | PS+EM-TuM11 Nanopantography with Reusable Membrane-based Electrostatic Lens Arrays Ryan Sawadichai, Y.-M. Chen, P. Basu, V.M. Donnelly, P. Ruchhoeft, D.J. Economou, University of Houston |